Spontaneously Conversion from Film to High Crystalline Quality Stripe during Molecular Beam Epitaxy for High Sn Content GeSn
文献类型：期刊论文
| 作者 | Nan Wang; Chunlai Xue; Fengshuo Wan; Yue Zhao; Guoyin Xu; Zhi Liu; Jun Zheng; Yuhua Zuo; Buwen Cheng ; Qiming Wang |
| 刊名 | SCIENTIFIC REPORTS
 |
| 出版日期 | 2020 |
| 卷号 | 10期号:1页码:6161 |
| 语种 | 英语 |
| 公开日期 | 2020 |
| 源URL | [http://ir.semi.ac.cn/handle/172111/30399]  |
| 专题 | 半导体研究所_光电子研究发展中心 |
| 推荐引用方式 GB/T 7714 | Nan Wang; Chunlai Xue; Fengshuo Wan; Yue Zhao; Guoyin Xu; Zhi Liu; Jun Zheng; Yuhua Zuo; Buwen Cheng ; Qiming Wang. Spontaneously Conversion from Film to High Crystalline Quality Stripe during Molecular Beam Epitaxy for High Sn Content GeSn[J]. SCIENTIFIC REPORTS,2020,10(1):6161. |
| APA | Nan Wang; Chunlai Xue; Fengshuo Wan; Yue Zhao; Guoyin Xu; Zhi Liu; Jun Zheng; Yuhua Zuo; Buwen Cheng ; Qiming Wang.(2020).Spontaneously Conversion from Film to High Crystalline Quality Stripe during Molecular Beam Epitaxy for High Sn Content GeSn.SCIENTIFIC REPORTS,10(1),6161. |
| MLA | Nan Wang; Chunlai Xue; Fengshuo Wan; Yue Zhao; Guoyin Xu; Zhi Liu; Jun Zheng; Yuhua Zuo; Buwen Cheng ; Qiming Wang."Spontaneously Conversion from Film to High Crystalline Quality Stripe during Molecular Beam Epitaxy for High Sn Content GeSn".SCIENTIFIC REPORTS 10.1(2020):6161. |
入库方式： OAI收割
来源：半导体研究所
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