Microstructure and Properties of WB2/Cr Multilayer Films with Different Bilayer Numbers Deposited by Magnetron Sputtering
文献类型：期刊论文
| 作者 | Shi, W. B.1,2; Liu, Y. M.3; Li, W. H.1,2; Li, T.1,2; Lei, H.2; Gong, J.2; Sun, C.2 |
| 刊名 | ACTA METALLURGICA SINICA-ENGLISH LETTERS
 |
| 出版日期 | 2021-08-09 |
| 页码 | 10 |
| 关键词 | WB2 Cr multilayer Magnetron sputtering Bilayer number Tribological behavior |
| ISSN号 | 1006-7191 |
| DOI | 10.1007/s40195-021-01285-3 |
| 通讯作者 | Sun, C.(csun@imr.ac.cn) |
| 英文摘要 | The influence of the bilayer number on the microstructure, mechanical properties, adhesion strength and tribological behaviors of the WB2/Cr multilayer films was systematically investigated in the present study. Five groups of WB2/Cr films with the same modulation ratio were synthesized by magnetron sputtering technique. The crystalline structure of the films was determined by X-ray diffraction. The morphologies and the microstructure of the films were observed by scanning electron microscopy, atomic force microscopy and transmission electron microscopy. Furthermore, Nano indenter, scratch tester and ball-on-disc tribometer were used to evaluate the mechanical and tribological properties. As bilayer numbers varied from 5 to 40, the hardness increased first and then decreased with the maximum hardness of 33.9 GPa when the bilayer number is 30. The H/E* and H-3/E-*2 values calculated to evaluate the fracture toughness showed the similar changing trend with hardness. The adhesion strength reached the maximum of 67 N when the bilayer number is 30. The surface roughness and friction coefficient decreased with increasing bilayer number. The wear mechanism was also investigated, and the results suggested that the multilayer film with bilayer number of 30 exhibited the best wear resistance (1.78 x 10(-7) mm(3)/Nm), benefiting from the contribution of high hardness, fracture toughness and adhesion strength. |
| 资助项目 | National Natural Science Foundation of China[51701157] |
| WOS研究方向 | Metallurgy & Metallurgical Engineering |
| 语种 | 英语 |
| WOS记录号 | WOS:000683323900001 |
| 出版者 | CHINESE ACAD SCIENCES, INST METAL RESEARCH |
| 资助机构 | National Natural Science Foundation of China |
| 源URL | [http://ir.imr.ac.cn/handle/321006/159541]  |
| 专题 | 金属研究所_中国科学院金属研究所 |
| 通讯作者 | Sun, C. |
| 作者单位 | 1.Univ Sci & Technol China, Sch Mat Sci & Engn, Shenyang 110016, Peoples R China 2.Chinese Acad Sci, Shi Changxu Innovat Ctr Adv Mat, Inst Met Res, Shenyang 110016, Peoples R China 3.Xian Shiyou Univ, Coll Mat Sci & Engn, Xian 710065, Peoples R China |
| 推荐引用方式 GB/T 7714 | Shi, W. B.,Liu, Y. M.,Li, W. H.,et al. Microstructure and Properties of WB2/Cr Multilayer Films with Different Bilayer Numbers Deposited by Magnetron Sputtering[J]. ACTA METALLURGICA SINICA-ENGLISH LETTERS,2021:10. |
| APA | Shi, W. B..,Liu, Y. M..,Li, W. H..,Li, T..,Lei, H..,...&Sun, C..(2021).Microstructure and Properties of WB2/Cr Multilayer Films with Different Bilayer Numbers Deposited by Magnetron Sputtering.ACTA METALLURGICA SINICA-ENGLISH LETTERS,10. |
| MLA | Shi, W. B.,et al."Microstructure and Properties of WB2/Cr Multilayer Films with Different Bilayer Numbers Deposited by Magnetron Sputtering".ACTA METALLURGICA SINICA-ENGLISH LETTERS (2021):10. |
入库方式： OAI收割
来源：金属研究所
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