FORMATION OF TITANIUM SILICIDE AND SHALLOW JUNCTIONS BY BF2+ IMPLANTATION AND LOW-TEMPERATURE ANNEALING
文献类型:期刊论文
作者 | ZHU, DZ(朱德彰) ; PAN, HC ; ZHU, FY(朱福英) ; CAO, JQ(曹建清) ; CAO, DX(曹德新) |
刊名 | NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS
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出版日期 | 1989 |
卷号 | 39期号:41278 |
ISSN号 | 0168-583X |
收录类别 | SCI |
语种 | 英语 |
公开日期 | 2013-09-11 |
源URL | [http://ir.sinap.ac.cn/handle/331007/12948] ![]() |
专题 | 上海应用物理研究所_中科院上海原子核所2003年前 |
推荐引用方式 GB/T 7714 | ZHU, DZ,PAN, HC,ZHU, FY,et al. FORMATION OF TITANIUM SILICIDE AND SHALLOW JUNCTIONS BY BF2+ IMPLANTATION AND LOW-TEMPERATURE ANNEALING[J]. NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS,1989,39(41278). |
APA | ZHU, DZ,PAN, HC,ZHU, FY,CAO, JQ,&CAO, DX.(1989).FORMATION OF TITANIUM SILICIDE AND SHALLOW JUNCTIONS BY BF2+ IMPLANTATION AND LOW-TEMPERATURE ANNEALING.NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS,39(41278). |
MLA | ZHU, DZ,et al."FORMATION OF TITANIUM SILICIDE AND SHALLOW JUNCTIONS BY BF2+ IMPLANTATION AND LOW-TEMPERATURE ANNEALING".NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS 39.41278(1989). |
入库方式: OAI收割
来源:上海应用物理研究所
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