中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
PULSED, Q-SWITCHED RUBY-LASER ANNEALING OF BI IMPLANTED SI CRYSTALS INVESTIGATED BY CHANNELING

文献类型:期刊论文

作者DEUTCH, BI ; TSOU, SC ; LEOU, SH ; ZHOU, ZY ; ZENG, HJ ; DAI, RZ ; CHU, TC ; CAO, DX(曹德新)
刊名RADIATION EFFECTS AND DEFECTS IN SOLIDS
出版日期1979
卷号45期号:41276
ISSN号1042-0150
收录类别SCI
语种英语
公开日期2013-09-11
源URL[http://ir.sinap.ac.cn/handle/331007/12975]  
专题上海应用物理研究所_中科院上海原子核所2003年前
推荐引用方式
GB/T 7714
DEUTCH, BI,TSOU, SC,LEOU, SH,et al. PULSED, Q-SWITCHED RUBY-LASER ANNEALING OF BI IMPLANTED SI CRYSTALS INVESTIGATED BY CHANNELING[J]. RADIATION EFFECTS AND DEFECTS IN SOLIDS,1979,45(41276).
APA DEUTCH, BI.,TSOU, SC.,LEOU, SH.,ZHOU, ZY.,ZENG, HJ.,...&CAO, DX.(1979).PULSED, Q-SWITCHED RUBY-LASER ANNEALING OF BI IMPLANTED SI CRYSTALS INVESTIGATED BY CHANNELING.RADIATION EFFECTS AND DEFECTS IN SOLIDS,45(41276).
MLA DEUTCH, BI,et al."PULSED, Q-SWITCHED RUBY-LASER ANNEALING OF BI IMPLANTED SI CRYSTALS INVESTIGATED BY CHANNELING".RADIATION EFFECTS AND DEFECTS IN SOLIDS 45.41276(1979).

入库方式: OAI收割

来源:上海应用物理研究所

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