PULSED, Q-SWITCHED RUBY-LASER ANNEALING OF BI IMPLANTED SI CRYSTALS INVESTIGATED BY CHANNELING
文献类型:期刊论文
作者 | DEUTCH, BI ; TSOU, SC ; LEOU, SH ; ZHOU, ZY ; ZENG, HJ ; DAI, RZ ; CHU, TC ; CAO, DX(曹德新) |
刊名 | RADIATION EFFECTS AND DEFECTS IN SOLIDS
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出版日期 | 1979 |
卷号 | 45期号:41276 |
ISSN号 | 1042-0150 |
收录类别 | SCI |
语种 | 英语 |
公开日期 | 2013-09-11 |
源URL | [http://ir.sinap.ac.cn/handle/331007/12975] ![]() |
专题 | 上海应用物理研究所_中科院上海原子核所2003年前 |
推荐引用方式 GB/T 7714 | DEUTCH, BI,TSOU, SC,LEOU, SH,et al. PULSED, Q-SWITCHED RUBY-LASER ANNEALING OF BI IMPLANTED SI CRYSTALS INVESTIGATED BY CHANNELING[J]. RADIATION EFFECTS AND DEFECTS IN SOLIDS,1979,45(41276). |
APA | DEUTCH, BI.,TSOU, SC.,LEOU, SH.,ZHOU, ZY.,ZENG, HJ.,...&CAO, DX.(1979).PULSED, Q-SWITCHED RUBY-LASER ANNEALING OF BI IMPLANTED SI CRYSTALS INVESTIGATED BY CHANNELING.RADIATION EFFECTS AND DEFECTS IN SOLIDS,45(41276). |
MLA | DEUTCH, BI,et al."PULSED, Q-SWITCHED RUBY-LASER ANNEALING OF BI IMPLANTED SI CRYSTALS INVESTIGATED BY CHANNELING".RADIATION EFFECTS AND DEFECTS IN SOLIDS 45.41276(1979). |
入库方式: OAI收割
来源:上海应用物理研究所
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