Development of hydrogen-free fully amorphous silicon oxycarbide coating by thermal organometallic chemical vapor deposition technique
文献类型：期刊论文
| 作者 | Liu, Housheng2,3; Tariq, Naeem ul Haq1; Han, Rifei2,3; Liu, Hanhui2,3; Cui, Xinyu3; Tang, Mingqiang3; Xiong, Tianying3 |
| 刊名 | JOURNAL OF NON-CRYSTALLINE SOLIDS
 |
| 出版日期 | 2022 |
| 卷号 | 575页码:8 |
| ISSN号 | 0022-3093 |
| 关键词 | Chemical vapor deposition Amorphous SiOC coating Amorphous carbon |
| DOI | 10.1016/j.jnoncrysol.2021.121204 |
| 通讯作者 | Tang, Mingqiang(mqtang@imr.ac.cn) ; Xiong, Tianying(tyxiong@imr.ac.cn) |
| 英文摘要 | In this study, a dense fully amorphous (hydrogen-free) silicon oxycarbide (SiOC) coating was successfully deposited by thermal organometallic chemical vapor deposition (thermal MOCVD) technique using mixtures of liquid hexamethyldisiloxane (HMDSO) and ethanol. The nature of chemical bonding, microstructure and mechanical properties of the prepared coating were studied using field emission scanning electron microscopy (FESEM), scanning transmission electron microscopy (STEM), 29Si magic-angle-spinning nuclear magnetic resonance (MAS NMR), X-ray photoelectron spectroscopy (XPS), Raman spectroscopy and nano indentation techniques. The results showed that the prepared silicon oxycarbide coating is fully amorphous and it is composed of SiO4 and SiO3C structural units. The hardness (11.0 GPa) and elastic modulus (96.0 GPa) of the prepared coating were comparable or even better than other SiOC ceramic materials prepared by traditional high temperature processing techniques. |
| WOS研究方向 | Materials Science |
| 语种 | 英语 |
| 出版者 | ELSEVIER |
| WOS记录号 | WOS:000709825200007 |
| 源URL | [http://ir.imr.ac.cn/handle/321006/167100]  |
| 专题 | 金属研究所_中国科学院金属研究所 |
| 通讯作者 | Tang, Mingqiang; Xiong, Tianying |
| 作者单位 | 1.Pakistan Inst Engn & Appl Sci, Dept Met & Mat Engn, Islamabad, Pakistan 2.Univ Sci & Technol China, Sch Mat Sci & Engn, Shenyang 110016, Peoples R China 3.Chinese Acad Sci, Shi Changxu Innovat Ctr Adv Mat, Inst Met Res, Shenyang 110016, Peoples R China |
| 推荐引用方式 GB/T 7714 | Liu, Housheng,Tariq, Naeem ul Haq,Han, Rifei,et al. Development of hydrogen-free fully amorphous silicon oxycarbide coating by thermal organometallic chemical vapor deposition technique[J]. JOURNAL OF NON-CRYSTALLINE SOLIDS,2022,575:8. |
| APA | Liu, Housheng.,Tariq, Naeem ul Haq.,Han, Rifei.,Liu, Hanhui.,Cui, Xinyu.,...&Xiong, Tianying.(2022).Development of hydrogen-free fully amorphous silicon oxycarbide coating by thermal organometallic chemical vapor deposition technique.JOURNAL OF NON-CRYSTALLINE SOLIDS,575,8. |
| MLA | Liu, Housheng,et al."Development of hydrogen-free fully amorphous silicon oxycarbide coating by thermal organometallic chemical vapor deposition technique".JOURNAL OF NON-CRYSTALLINE SOLIDS 575(2022):8. |
入库方式： OAI收割
来源：金属研究所
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