中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Overwhelming coexistence of negative differential resistance effect and RRAM

文献类型:期刊论文

作者Guo, T.; Sun, B.; Zhou, Y.; Zhao, H. B.; Lei, M.; Zhao, Y.
刊名Physical Chemistry Chemical Physics
出版日期2018
卷号20期号:31页码:20635-20640
关键词resistive switching memories film nanoparticles mechanisms filaments devices Chemistry Physics
ISSN号1463-9076
DOI10.1039/c8cp03492c
英文摘要An electronic cell that possesses synchronously multi-physical properties is of great importance in the applications of multifunctional electronic devices. In this study, an overwhelming coexistence of negative differential resistance (NDR) effect and resistive switching (RS) memory behavior at room temperature was observed based on Ag/Cu2ZnSnSe4 (CZTSe)/Mo devices. The long retention time of approximate to 10(4) s and high HRS/LRS resistance ratio of approximate to 215 can be achieved, indicating that our devices possess excellent resistance random access memory (RRAM). Moreover, strong NDR behavior was observed at room temperature, which provides a great potential application in advanced electronic devices. Finally, the combined physical model of conductive filament and Schottky barrier reinstallment is demonstrated to explain the coexistence phenomenon. Thus, in this, study we propose a new strategy for preparing a multifunctional electronic device with multiple physical attributes in the future.
源URL[http://ir.ciomp.ac.cn/handle/181722/60760]  
专题中国科学院长春光学精密机械与物理研究所
推荐引用方式
GB/T 7714
Guo, T.,Sun, B.,Zhou, Y.,et al. Overwhelming coexistence of negative differential resistance effect and RRAM[J]. Physical Chemistry Chemical Physics,2018,20(31):20635-20640.
APA Guo, T.,Sun, B.,Zhou, Y.,Zhao, H. B.,Lei, M.,&Zhao, Y..(2018).Overwhelming coexistence of negative differential resistance effect and RRAM.Physical Chemistry Chemical Physics,20(31),20635-20640.
MLA Guo, T.,et al."Overwhelming coexistence of negative differential resistance effect and RRAM".Physical Chemistry Chemical Physics 20.31(2018):20635-20640.

入库方式: OAI收割

来源:长春光学精密机械与物理研究所

浏览0
下载0
收藏0
其他版本

除非特别说明,本系统中所有内容都受版权保护,并保留所有权利。