中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Illumination uniformity improvement in digital micromirror device based scanning photolithography system

文献类型:期刊论文

作者Xiong, Z.; Liu, H.; Chen, R. H.; Xu, J.; Li, Q. K.; Li, J. H.; Zhang, W. J.
刊名Optics Express
出版日期2018
卷号26期号:14页码:18597-18607
关键词maskless lithography dmd fabrication elements Optics
ISSN号1094-4087
DOI10.1364/oe.26.018597
英文摘要Illumination uniformity in photolithography systems determines the dimensional difference across the entire lithographic substrate. However, traditional lithography system relies on expensive and complex illumination system for achieving uniform illumination. In this paper, we propose a simple and cost-effective method based on the modulation of digital micromirror device to improve illumination uniformity. The modulation according to a digital mask achieved via an iteration program improves the uniformity to be above 95%. We demonstrate the effectiveness of the method by experimentally fabricating a linear grating. By implementing this method, the maximum dimensional difference is decreased from 3.3 mu m to 0.3 mu m. Further simulations indicate that higher uniformity is achievable once the field of view on the DMD is divided into smaller subregions. (C) 2018 Optical Society of America under the terms of the OSA Open Access Publishing Agreement
源URL[http://ir.ciomp.ac.cn/handle/181722/61025]  
专题中国科学院长春光学精密机械与物理研究所
推荐引用方式
GB/T 7714
Xiong, Z.,Liu, H.,Chen, R. H.,et al. Illumination uniformity improvement in digital micromirror device based scanning photolithography system[J]. Optics Express,2018,26(14):18597-18607.
APA Xiong, Z..,Liu, H..,Chen, R. H..,Xu, J..,Li, Q. K..,...&Zhang, W. J..(2018).Illumination uniformity improvement in digital micromirror device based scanning photolithography system.Optics Express,26(14),18597-18607.
MLA Xiong, Z.,et al."Illumination uniformity improvement in digital micromirror device based scanning photolithography system".Optics Express 26.14(2018):18597-18607.

入库方式: OAI收割

来源:长春光学精密机械与物理研究所

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