Femtosecond pulsed laser induced damage characteristics on Si-based multi-layer film
文献类型：期刊论文
| 作者 | C.-B.Zheng; J.-F.Shao; X.-L.Li; H.-L.Wang; C.-R.Wang |
| 刊名 | Chinese Optics
 |
| 出版日期 | 2019 |
| 卷号 | 12期号:2页码:371-381 |
| 关键词 | Laser damage,Ablation,Electromagnetic pulse,Laser ablation,Laser produced plasmas,Pulsed lasers,Ultrafast lasers |
| ISSN号 | 20951531 |
| DOI | 10.3788/CO.20191202.0371 |
| 英文摘要 | In order to understand the ultrafast laser-induced damage mechanisms of typical imaging sensor's film structures, the damage characteristics of Si-based multi-layer films irradiated by a femtosecond pulsed laser were investigated, and the laser pulse fluence ranges and threshold conditions corresponding to various damage phenomena were evaluated. Si-based multi-layer films that were similar in structure of CCD were prepared by electron beam deposition. The damage characteristics of these films irradiated by a femtosecond pulsed laser with wavelength of 800 nm and pulse width of 100 fs under different pulse fluences and numbers were investigated using a metallurgical microscope. Experimental results showed that the laser-affected zone size increased linearly with pulse fluence in the range of 1.01 to 24.7 J/cm2. Surface damage caused by oxidation/amorphization, non-thermal ablation, and laser-induced plasma ablation could be observed in the laser irradiated zone, which tightly depended on the pulse fluence. Multi-layer damage could be observed and the damage probability increased from 1% to 51% in the pulse fluence range from 2.42 to 24.7 J/cm2. Irradiated by sequent pulses at a fluence of 1.01 J/cm2, the laser affected zone remained almost unchanged and the ablated depth increased with the pulse number. From the single pulse damage experiment data, the femtosecond pulse laser-induced surface damage threshold was evaluated to be 0.543 J/cm2 and laser-induced multi-layer stress damage threshold was linearly fitted to be 2.16 J/cm2. Sequent pulse irradiation with low fluence(1.01 J/cm2) also could lead to deep damage on the multi-layer film. 2019, China Science Publishing & Media LTD. All right reserved. |
| URL标识 | 查看原文 |
| 源URL | [http://ir.ciomp.ac.cn/handle/181722/62744]  |
| 专题 | 中国科学院长春光学精密机械与物理研究所 |
| 推荐引用方式 GB/T 7714 | C.-B.Zheng,J.-F.Shao,X.-L.Li,et al. Femtosecond pulsed laser induced damage characteristics on Si-based multi-layer film[J]. Chinese Optics,2019,12(2):371-381. |
| APA | C.-B.Zheng,J.-F.Shao,X.-L.Li,H.-L.Wang,&C.-R.Wang.(2019).Femtosecond pulsed laser induced damage characteristics on Si-based multi-layer film.Chinese Optics,12(2),371-381. |
| MLA | C.-B.Zheng,et al."Femtosecond pulsed laser induced damage characteristics on Si-based multi-layer film".Chinese Optics 12.2(2019):371-381. |
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