中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Piecewise Linear Weighted Iterative Algorithm for Beam Alignment in Scanning Beam Interference Lithography

文献类型:期刊论文

作者Y.Song; Bayanheshig; S.Li; S.Jiang; W.Wang
刊名Photonic Sensors
出版日期2019
卷号9期号:4页码:344-355
关键词Piecewise linear weighted iterative algorithm,beam alignment,scanning,beam interference lithography (SBIL),overshoot suppression,convergence,speed,femtosecond laser,fabrication,gratings,crystal,system,Instruments & Instrumentation,Optics
ISSN号1674-9251
DOI10.1007/s13320-019-0537-x
英文摘要To obtain a good interference fringe contrast and high fidelity, an automated beam iterative alignment is achieved in scanning beam interference lithography (SBIL). To solve the problem of alignment failure caused by a large beam angle (or position) overshoot exceeding the detector range while also speeding up the convergence, a weighted iterative algorithm using a weight parameter that is changed linearly piecewise is proposed. The changes in the beam angle and position deviation during the alignment process based on different iterative algorithms are compared by experiment and simulation. The results show that the proposed iterative algorithm can be used to suppress the beam angle (or position) overshoot, avoiding alignment failure caused by over-ranging. In addition, the convergence speed can be effectively increased. The algorithm proposed can optimize the beam alignment process in SBIL.
语种英语
源URL[http://ir.ciomp.ac.cn/handle/181722/63073]  
专题中国科学院长春光学精密机械与物理研究所
推荐引用方式
GB/T 7714
Y.Song,Bayanheshig,S.Li,et al. Piecewise Linear Weighted Iterative Algorithm for Beam Alignment in Scanning Beam Interference Lithography[J]. Photonic Sensors,2019,9(4):344-355.
APA Y.Song,Bayanheshig,S.Li,S.Jiang,&W.Wang.(2019).Piecewise Linear Weighted Iterative Algorithm for Beam Alignment in Scanning Beam Interference Lithography.Photonic Sensors,9(4),344-355.
MLA Y.Song,et al."Piecewise Linear Weighted Iterative Algorithm for Beam Alignment in Scanning Beam Interference Lithography".Photonic Sensors 9.4(2019):344-355.

入库方式: OAI收割

来源:长春光学精密机械与物理研究所

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