Maskless laser nano-lithography of glass through sequential activation of multi-threshold ablation
文献类型：期刊论文
| 作者 | Y.Z.He; J.H.Zhang; S.Singh; E.Garcell; A.Y.Vorobyev |
| 刊名 | Applied Physics Letters
 |
| 出版日期 | 2019 |
| 卷号 | 114期号:13页码:5 |
| 关键词 | femtosecond laser,pattern-formation,surface,metals,Physics |
| ISSN号 | 0003-6951 |
| DOI | 10.1063/1.5080344 |
| 英文摘要 | Controllable nanofabrication is at the very foundation of nano-science and nano-technology. Today, ultrafast laser writing has been broadly adopted for micro-fabrication because of its ability to make precise and rapid processing of almost all types of materials in an ambient environment. However, direct laser writing is typically unsuitable for high-quality 2D nano-patterning. In this work, we introduce a maskless laser nano-lithographic technique that allows us to create regular 2D periodic nanopatterns on glass. Glass is a particularly challenging material since it does not absorb light readily. Our strategy starts with a glass sample being coated with a thin layer of metal, and then irradiated with a series of pulse bursts at progressively increasing fluence levels. This process allows us to sequentially activate a series of tailored physical processes that lead to the formation of regular 2D periodic nanopatterns on glass. The formation mechanism of this nano-patterning is also simulated numerically and further corroborated by a series of control experiments. We also show controllability in forming various shapes and sizes of nanopatterns through tailored fluence doses. Our technique provides a high-speed and low-cost method for glass nanofabrication. Published under license by AIP Publishing. |
| URL标识 | 查看原文 |
| 语种 | 英语 |
| 源URL | [http://ir.ciomp.ac.cn/handle/181722/63330]  |
| 专题 | 中国科学院长春光学精密机械与物理研究所 |
| 推荐引用方式 GB/T 7714 | Y.Z.He,J.H.Zhang,S.Singh,et al. Maskless laser nano-lithography of glass through sequential activation of multi-threshold ablation[J]. Applied Physics Letters,2019,114(13):5. |
| APA | Y.Z.He,J.H.Zhang,S.Singh,E.Garcell,&A.Y.Vorobyev.(2019).Maskless laser nano-lithography of glass through sequential activation of multi-threshold ablation.Applied Physics Letters,114(13),5. |
| MLA | Y.Z.He,et al."Maskless laser nano-lithography of glass through sequential activation of multi-threshold ablation".Applied Physics Letters 114.13(2019):5. |
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