中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Vertical GaN-on-GaN PIN diodes fabricated on free-standing GaN wafer using an ammonothermal method

文献类型:期刊论文

作者S.W.H.Chen; H.Y.Wang; C.Hu; Y.Chen; H.Wang; J.L.Wang; W.He
刊名Journal of Alloys and Compounds
出版日期2019
卷号804页码:435-440
关键词Free standing gallium nitride (GaN),GaN-On-GaN,Power PIN diode,p-n diodes,Chemistry
ISSN号0925-8388
DOI10.1016/j.jallcom.2019.07.021
英文摘要We report vertical GaN-on-GaN PIN diodes with a record high figure-of-merit (V-BR(2)/R-on) of 29.7 GW/cm(2) on free-standing GaN wafer using a complementary metal-oxide-semiconductor (CMOS) compatible contact materials. Due to the low substrate resistivity, low contact resistance, and high quality of GaN drift layer, a low on-state resistance R(on )of 0.31 m Omega cm(2) is obtained. With integrating of the metal filed plate structure in the vertical device, the peak electrical field along the GaN mesa edge can be significantly reduced, thus leading to a high breakdown voltage V-BR of 3.04 kV. The vertical GaN-on-GaN PIN diodes in this work show turn-on voltage V-on of similar to 3.4 V, on/off current ratio of similar to 1.3 x 10(7), and ideal factor n of similar to 2.2. According to the reverse switching measurement, the reverse recovery time T-rr. (reverse recovery charge Q(rr)) is 22.8 ns (4.8 nC) and 24.0 ns (5.4 nC), respectively, under a testing temperature of 300 K and 500 K. (C) 2019 Elsevier B.V. All rights reserved.
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语种英语
源URL[http://ir.ciomp.ac.cn/handle/181722/63452]  
专题中国科学院长春光学精密机械与物理研究所
推荐引用方式
GB/T 7714
S.W.H.Chen,H.Y.Wang,C.Hu,et al. Vertical GaN-on-GaN PIN diodes fabricated on free-standing GaN wafer using an ammonothermal method[J]. Journal of Alloys and Compounds,2019,804:435-440.
APA S.W.H.Chen.,H.Y.Wang.,C.Hu.,Y.Chen.,H.Wang.,...&W.He.(2019).Vertical GaN-on-GaN PIN diodes fabricated on free-standing GaN wafer using an ammonothermal method.Journal of Alloys and Compounds,804,435-440.
MLA S.W.H.Chen,et al."Vertical GaN-on-GaN PIN diodes fabricated on free-standing GaN wafer using an ammonothermal method".Journal of Alloys and Compounds 804(2019):435-440.

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来源:长春光学精密机械与物理研究所

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