Vertical GaN-on-GaN PIN diodes fabricated on free-standing GaN wafer using an ammonothermal method
文献类型:期刊论文
作者 | S.W.H.Chen; H.Y.Wang; C.Hu; Y.Chen; H.Wang; J.L.Wang; W.He |
刊名 | Journal of Alloys and Compounds
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出版日期 | 2019 |
卷号 | 804页码:435-440 |
关键词 | Free standing gallium nitride (GaN),GaN-On-GaN,Power PIN diode,p-n diodes,Chemistry |
ISSN号 | 0925-8388 |
DOI | 10.1016/j.jallcom.2019.07.021 |
英文摘要 | We report vertical GaN-on-GaN PIN diodes with a record high figure-of-merit (V-BR(2)/R-on) of 29.7 GW/cm(2) on free-standing GaN wafer using a complementary metal-oxide-semiconductor (CMOS) compatible contact materials. Due to the low substrate resistivity, low contact resistance, and high quality of GaN drift layer, a low on-state resistance R(on )of 0.31 m Omega cm(2) is obtained. With integrating of the metal filed plate structure in the vertical device, the peak electrical field along the GaN mesa edge can be significantly reduced, thus leading to a high breakdown voltage V-BR of 3.04 kV. The vertical GaN-on-GaN PIN diodes in this work show turn-on voltage V-on of similar to 3.4 V, on/off current ratio of similar to 1.3 x 10(7), and ideal factor n of similar to 2.2. According to the reverse switching measurement, the reverse recovery time T-rr. (reverse recovery charge Q(rr)) is 22.8 ns (4.8 nC) and 24.0 ns (5.4 nC), respectively, under a testing temperature of 300 K and 500 K. (C) 2019 Elsevier B.V. All rights reserved. |
URL标识 | 查看原文 |
语种 | 英语 |
源URL | [http://ir.ciomp.ac.cn/handle/181722/63452] ![]() |
专题 | 中国科学院长春光学精密机械与物理研究所 |
推荐引用方式 GB/T 7714 | S.W.H.Chen,H.Y.Wang,C.Hu,et al. Vertical GaN-on-GaN PIN diodes fabricated on free-standing GaN wafer using an ammonothermal method[J]. Journal of Alloys and Compounds,2019,804:435-440. |
APA | S.W.H.Chen.,H.Y.Wang.,C.Hu.,Y.Chen.,H.Wang.,...&W.He.(2019).Vertical GaN-on-GaN PIN diodes fabricated on free-standing GaN wafer using an ammonothermal method.Journal of Alloys and Compounds,804,435-440. |
MLA | S.W.H.Chen,et al."Vertical GaN-on-GaN PIN diodes fabricated on free-standing GaN wafer using an ammonothermal method".Journal of Alloys and Compounds 804(2019):435-440. |
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