EUV multilayer mirrors in solar X-EUV Imager
文献类型：期刊论文
| 作者 | H. F. Wang,X. D. Wang,B. Chen,Y. Q. Wang,S. L. Mao,S. Ren,P. Zhou,Y. Liu,T. L. Huo and H. J. Zhou |
| 刊名 | Optik
 |
| 出版日期 | 2020 |
| 卷号 | 204页码:8 |
| ISSN号 | 0030-4026 |
| DOI | 10.1016/j.ijleo.2020.164213 |
| 英文摘要 | Fe XII line (19.5 nm) is one of important targets of imaging detection in solar spectrum, and 19.5 nm multilayer mirrors were employed to reflect 19.5 nm line and suppress sidelobe. 19.5 nm multilayer mirrors with a bandwidth of 1.0 nm are in demand in Solar X-EUV imager installed in FengYun III satellite. Thickness ratios of Mo layer of 0.15 and 0.11, respectively, are utilized in multilayer mirrors at normal and 45 degrees incidence. The influence of roughness/diffusion on reflectance is discussed, and profile changes of substrate after deposition are also analyzed. |
| URL标识 | 查看原文 |
| 语种 | 英语 |
| 源URL | [http://ir.ciomp.ac.cn/handle/181722/64502]  |
| 专题 | 中国科学院长春光学精密机械与物理研究所 |
| 推荐引用方式 GB/T 7714 | H. F. Wang,X. D. Wang,B. Chen,Y. Q. Wang,S. L. Mao,S. Ren,P. Zhou,Y. Liu,T. L. Huo and H. J. Zhou. EUV multilayer mirrors in solar X-EUV Imager[J]. Optik,2020,204:8. |
| APA | H. F. Wang,X. D. Wang,B. Chen,Y. Q. Wang,S. L. Mao,S. Ren,P. Zhou,Y. Liu,T. L. Huo and H. J. Zhou.(2020).EUV multilayer mirrors in solar X-EUV Imager.Optik,204,8. |
| MLA | H. F. Wang,X. D. Wang,B. Chen,Y. Q. Wang,S. L. Mao,S. Ren,P. Zhou,Y. Liu,T. L. Huo and H. J. Zhou."EUV multilayer mirrors in solar X-EUV Imager".Optik 204(2020):8. |
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