中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Three-Dimensional Mechanistic Modeling of Gate Leakage Current in High- κ MOSFETs

文献类型:期刊论文

作者Feilong Liu;   Yue-Yang Liu;   Ling Li;   Guofu Zhou;   Xiangwei Jiang;   Jun-Wei Luo
刊名PHYSICAL REVIEW APPLIED
出版日期2020
卷号13期号:2页码:024020
源URL[http://ir.semi.ac.cn/handle/172111/30600]  
专题半导体研究所_半导体超晶格国家重点实验室
推荐引用方式
GB/T 7714
Feilong Liu; Yue-Yang Liu; Ling Li; Guofu Zhou; Xiangwei Jiang; Jun-Wei Luo. Three-Dimensional Mechanistic Modeling of Gate Leakage Current in High- κ MOSFETs[J]. PHYSICAL REVIEW APPLIED,2020,13(2):024020.
APA Feilong Liu; Yue-Yang Liu; Ling Li; Guofu Zhou; Xiangwei Jiang; Jun-Wei Luo.(2020).Three-Dimensional Mechanistic Modeling of Gate Leakage Current in High- κ MOSFETs.PHYSICAL REVIEW APPLIED,13(2),024020.
MLA Feilong Liu; Yue-Yang Liu; Ling Li; Guofu Zhou; Xiangwei Jiang; Jun-Wei Luo."Three-Dimensional Mechanistic Modeling of Gate Leakage Current in High- κ MOSFETs".PHYSICAL REVIEW APPLIED 13.2(2020):024020.

入库方式: OAI收割

来源:半导体研究所

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