Electropolishing behavior of niobium in choline chloride-based deep eutectic solvents
文献类型：期刊论文
| 作者 | Chu, Qingwei ; Wu, Andong; Tan, Teng; Guo, Hao; Xiong, Pingran; Huang, Shichun; He, Yuan
|
| 刊名 | APPLIED SURFACE SCIENCE
 |
| 出版日期 | 2021-06-01 |
| 卷号 | 550页码:11 |
| ISSN号 | 0169-4332 |
| 关键词 | Nb rotating disk electrode Deep eutectic solvents Electropolishing mechanism Electrochemical impedance spectroscopy XPS depth profile |
| DOI | 10.1016/j.apsusc.2021.149322 |
| 通讯作者 | Chu, Qingwei(chuqingwei@impcas.ac.cn) ; He, Yuan(hey@impcas.ac.cn) |
| 英文摘要 | The electropolishing (EP) mechanism of niobium (Nb) in relatively eco-friendly deep eutectic solvents (DES) instead of the widely used HF-based electrolyte was studied by anodic polarization (AP) tests and electrochemical impedance spectroscopy (EIS) using a rotating disk electrode (RDE) of Nb. The AP test results reveal that the EP progress of Nb is under a mixed control of ionic transport and charge transfer. EIS results suggest the niobium EP process is consistent with the compact salt film mechanism in this electrolyte. The influence of applied potential and electrolyte temperature on the EP rate, surface roughness, and surface glossiness of Nb was also investigated. The crystal structure, chemical composition and surface morphology of Nb samples before and after EP were analyzed by XRD, XPS, and SEM. The grain sizes and preferential orientation of Nb before and after EP are changed. XPS depth profiling has been produced by sputtering with Ar+ ions which revealed that with the increase of Ar+ sputtering depth, the content of low-valence Nb0, NbO increases, high-valence Nb2O5 decreases, and middle-valence NbO2 increases first and then decreases. It indicates the existence of the Nb ? Nb2+?Nb4+?Nb5+ transition process. An even and mirror-like Nb surface can be obtained after EP from DES. |
| 资助项目 | National Natural Science Foundation of China[11705252] ; Scientific instrument development project of Chinese Academy of Sciences[E028861Y] ; Key research project of the Chinese Academy of Sciences[QYZDY-SSWJSC019] |
| WOS研究方向 | Chemistry ; Materials Science ; Physics |
| 语种 | 英语 |
| 出版者 | ELSEVIER |
| WOS记录号 | WOS:000634105800007 |
| 资助机构 | National Natural Science Foundation of China ; Scientific instrument development project of Chinese Academy of Sciences ; Key research project of the Chinese Academy of Sciences |
| 源URL | [http://119.78.100.186/handle/113462/137681]  |
| 专题 | 中国科学院近代物理研究所 |
| 通讯作者 | Chu, Qingwei; He, Yuan |
| 作者单位 | Chinese Acad Sci, Inst Modern Phys, 509 Nanchang Rd, Lanzhou 730000, Gansu, Peoples R China |
| 推荐引用方式 GB/T 7714 | Chu, Qingwei,Wu, Andong,Tan, Teng,et al. Electropolishing behavior of niobium in choline chloride-based deep eutectic solvents[J]. APPLIED SURFACE SCIENCE,2021,550:11. |
| APA | Chu, Qingwei.,Wu, Andong.,Tan, Teng.,Guo, Hao.,Xiong, Pingran.,...&He, Yuan.(2021).Electropolishing behavior of niobium in choline chloride-based deep eutectic solvents.APPLIED SURFACE SCIENCE,550,11. |
| MLA | Chu, Qingwei,et al."Electropolishing behavior of niobium in choline chloride-based deep eutectic solvents".APPLIED SURFACE SCIENCE 550(2021):11. |
入库方式： OAI收割
来源：近代物理研究所
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