An investigation of FinFET single-event latch-up characteristic and mitigation method
文献类型:期刊论文
作者 | Li, Dongqing1,2,3; Liu, Tianqi1; Wu, Zhenyu4; Cai, Chang1,2; Zhao, Peixiong1,2![]() ![]() |
刊名 | MICROELECTRONICS RELIABILITY
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出版日期 | 2020-11-01 |
卷号 | 114页码:8 |
关键词 | TCAD FinFET SCR SEL |
ISSN号 | 0026-2714 |
DOI | 10.1016/j.microrel.2020.113901 |
通讯作者 | Li, Dongqing(lidongqing@impcas.ac.cn) ; Liu, Tianqi(liutianqi@mail.tsinghua.edu.cn) |
英文摘要 | FinFET technology compared with planar have an increased sensitivity to single-event latch-up. TCAD simulation demonstrates that the reduction in width of MOSFET, thickness of shallow trench isolation (STI) and nMOS-to-pMOS lateral spacing will reduce the holding voltage, critical charge and increase the current gain of parasitic CMOS Silicon Controlled Rectifier (SCR). Through circuit analysis, it found that the change of parasitic vertical and horizontal resistance is mainly responsible for aforementioned phenomena. In addition, we found that the common protective measures such as guard rings spacing and epitaxial substrate become increasingly difficult. Based on the current preventive methods, we think that appropriate increasing the doping depth or the width of guard rings will improve protection from SingleEvent Latch-up (SEL). Moreover, we verify the effectiveness of our methods by TCAD simulation and discuss the feasibility. |
资助项目 | National Natural Science Foundation of China[11675233] ; National Natural Science Foundation of China[11690041] ; National Natural Science Foundation of China[11805244] |
WOS研究方向 | Engineering ; Science & Technology - Other Topics ; Physics |
语种 | 英语 |
WOS记录号 | WOS:000593888100009 |
出版者 | PERGAMON-ELSEVIER SCIENCE LTD |
资助机构 | National Natural Science Foundation of China |
源URL | [http://119.78.100.186/handle/113462/138426] ![]() |
专题 | 中国科学院近代物理研究所 |
通讯作者 | Li, Dongqing; Liu, Tianqi |
作者单位 | 1.Chinese Acad Sci, Inst Modern Phys, Lanzhou 730000, Peoples R China 2.Univ Chinese Acad Sci, Beijing 100049, Peoples R China 3.Lanzhou Univ, Sch Phys Sci & Technol, Lanzhou 730000, Peoples R China 4.Natl Univ Def Technol, Changsha 410000, Peoples R China |
推荐引用方式 GB/T 7714 | Li, Dongqing,Liu, Tianqi,Wu, Zhenyu,et al. An investigation of FinFET single-event latch-up characteristic and mitigation method[J]. MICROELECTRONICS RELIABILITY,2020,114:8. |
APA | Li, Dongqing.,Liu, Tianqi.,Wu, Zhenyu.,Cai, Chang.,Zhao, Peixiong.,...&Liu, Jie.(2020).An investigation of FinFET single-event latch-up characteristic and mitigation method.MICROELECTRONICS RELIABILITY,114,8. |
MLA | Li, Dongqing,et al."An investigation of FinFET single-event latch-up characteristic and mitigation method".MICROELECTRONICS RELIABILITY 114(2020):8. |
入库方式: OAI收割
来源:近代物理研究所
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