中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Multiple Layout-Hardening Comparison of SEU-Mitigated Filp-Flops in 22-nm UTBB FD-SOI Technology

文献类型:期刊论文

作者Cai, Chang1,2; Liu, Tianqi1,2; Zhao, Peixiong1,2; Fan, Xue3,4; Huang, Hongyang5; Li, Dongqing1,2; Ke, Lingyun1,2; He, Ze1,2; Xu, LieWei6; Chen, Gengsheng6
刊名IEEE TRANSACTIONS ON NUCLEAR SCIENCE
出版日期2020
卷号67期号:1页码:374-381
关键词D filp-flops (DFFs) heavy ions radiation hardening single-event upsets (SEUs) ultrathin body and buried oxide fully depleted silicon on insulator (UTBB FDSOI)
ISSN号0018-9499
DOI10.1109/TNS.2019.2956171
通讯作者Liu, Jie(j.liu@impcas.ac.cn)
英文摘要The standard and layout-hardened D filp-flops (DFFs) named DFF1-6 were designed and manufactured based on an advanced 22-nm ultrathin body and buried oxide fully depleted silicon-on-insulator (UTBB FD-SOI) technology. Heavy-ion irradiation results indicate that FD-SOI technology has contributions to radiation hardness and the hardened DFFs have higher single-event upset (SEU) tolerance than the standard DFF. The upsets induced by the embedded SET targets are strongly dependent on the testing frequency. The layout separating the dual interlocked storage cell (DICE) structure can prevent the direct occurrence of SEU in flip-flop cells, and upsets were removed completely in two-fold DICE structure DFFs.
WOS关键词SINGLE-EVENT UPSET ; TRANSIENTS
资助项目National Natural Science Foundation of China[11805244] ; National Natural Science Foundation of China[11690041] ; National Natural Science Foundation of China[11675233]
WOS研究方向Engineering ; Nuclear Science & Technology
语种英语
WOS记录号WOS:000510824300003
出版者IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
资助机构National Natural Science Foundation of China
源URL[http://119.78.100.186/handle/113462/141675]  
专题中国科学院近代物理研究所
通讯作者Liu, Jie
作者单位1.Chinese Acad Sci, Inst Modern Phys, Lanzhou 730000, Peoples R China
2.Univ Chinese Acad Sci, Sch Nucl Sci & Technol, Beijing 100049, Peoples R China
3.Chengdu Technol Univ, Sch Elect Engn, Chengdu 611730, Peoples R China
4.Univ Elect Sci & Technol China, Sch Elect Sci & Engn, Chengdu 610054, Peoples R China
5.Univ Elect Sci & Technol China, Chengdu 610054, Peoples R China
6.Fudan Univ, State Key Lab ASIC & Syst, Shanghai 201203, Peoples R China
推荐引用方式
GB/T 7714
Cai, Chang,Liu, Tianqi,Zhao, Peixiong,et al. Multiple Layout-Hardening Comparison of SEU-Mitigated Filp-Flops in 22-nm UTBB FD-SOI Technology[J]. IEEE TRANSACTIONS ON NUCLEAR SCIENCE,2020,67(1):374-381.
APA Cai, Chang.,Liu, Tianqi.,Zhao, Peixiong.,Fan, Xue.,Huang, Hongyang.,...&Liu, Jie.(2020).Multiple Layout-Hardening Comparison of SEU-Mitigated Filp-Flops in 22-nm UTBB FD-SOI Technology.IEEE TRANSACTIONS ON NUCLEAR SCIENCE,67(1),374-381.
MLA Cai, Chang,et al."Multiple Layout-Hardening Comparison of SEU-Mitigated Filp-Flops in 22-nm UTBB FD-SOI Technology".IEEE TRANSACTIONS ON NUCLEAR SCIENCE 67.1(2020):374-381.

入库方式: OAI收割

来源:近代物理研究所

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