Aerosol Jet Printing of Graphene and Carbon Nanotube Patterns on Realistically Rugged Substrates
文献类型：期刊论文
| 作者 | Kaindl, Reinhard2; Gupta, Tushar7; Bluemel, Alexander6; Pei, Songfeng5; Hou, Peng-Xiang5; Du, Jinhong; Liu, Chang5; Patter, Paul2,6; Popovic, Karl6; Dergez, David4 |
| 刊名 | ACS OMEGA
 |
| 出版日期 | 2021-12-10 |
| 页码 | 13 |
| ISSN号 | 2470-1343 |
| DOI | 10.1021/acsomega.1c03871 |
| 通讯作者 | Kaindl, Reinhard(reinhard.kaindl@joanneum.at) ; Bayer, Bernhard C.(bernhard.bayer-skoff@tuwien.ac.at) |
| 英文摘要 | Direct-write additive manufacturing of graphene and carbon nanotube (CNT) patterns by aerosol jet printing (AJP) is promising for the creation of thermal and electrical interconnects in (opto)electronics. In realistic application scenarios, this however often requires deposition of graphene and CNT patterns on rugged substrates such as, for example, roughly machined and surface oxidized metal block heat sinks. Most AJP of graphene/CNT patterns has thus far however concentrated on flat wafer-or foil type substrates. Here, we demonstrate AJP of graphene and single walled CNT (SWCNT) patterns on realistically rugged plasma electrolytic-oxidized (PEO) Al blocks, which are promising heat sink materials. We show that AJP on the rugged substrates offers line resolution of down to similar to 40 mu m width for single AJP passes, however, at the cost of noncomplete substrate coverage including noncovered mu m-sized pores in the PEO Al blocks. With multiple AJP passes, full coverage including coverage of the pores is, however, readily achieved. Comparing archetypical aqueous and organic graphene and SWCNT inks, we show that the choice of the ink system drastically influences the nanocarbon AJP parameter window, deposit microstructure including crystalline quality, compactness of deposit, and inter/intrapass layer adhesion for multiple passes. Simple electrical characterization indicates aqueous graphene inks as the most promising choice for AJP-deposited electrical interconnect applications. Our parameter space screening thereby forms a framework for rational process development for graphene and SWCNT AJP on application-relevant, rugged substrates. |
| 资助项目 | Austrian Ministry of Transport, Innovation and Technology ; Austrian Research Promotion Agency (FFG)[857181-GRATEC] ; Chinese Academy of Sciences[174321KYSB20160011] ; TU Wien Bibliothek |
| WOS研究方向 | Chemistry |
| 语种 | 英语 |
| WOS记录号 | WOS:000731157400001 |
| 出版者 | AMER CHEMICAL SOC |
| 资助机构 | Austrian Ministry of Transport, Innovation and Technology ; Austrian Research Promotion Agency (FFG) ; Chinese Academy of Sciences ; TU Wien Bibliothek |
| 源URL | [http://ir.imr.ac.cn/handle/321006/167268]  |
| 专题 | 金属研究所_中国科学院金属研究所 |
| 通讯作者 | Kaindl, Reinhard; Bayer, Bernhard C. |
| 作者单位 | 1.Univ Vienna, Fac Phys, A-1090 Vienna, Austria 2.Joanneum Res, Mat Surface Technol & Photon, A-8712 Niklasdorf, Austria 3.Chalmers Univ Technol, Dept Microtechnol & Nanosci, Elect Mat & Syst Lab, SE-41296 Gothenburg, Sweden 4.ZKW Elekt GmbH, A-2700 Neustadt, Austria 5.Chinese Acad Sci, Shenyang Natl Lab Mat Sci, Inst Met Res, Shenyang 110016, Peoples R China 6.Joanneum Res, Inst Surface Technol & Photon, Mat, A-8160 Weiz, Austria 7.Tech Univ Wien TU Wien, Inst Mat Chem, A-1060 Vienna, Austria |
| 推荐引用方式 GB/T 7714 | Kaindl, Reinhard,Gupta, Tushar,Bluemel, Alexander,et al. Aerosol Jet Printing of Graphene and Carbon Nanotube Patterns on Realistically Rugged Substrates[J]. ACS OMEGA,2021:13. |
| APA | Kaindl, Reinhard.,Gupta, Tushar.,Bluemel, Alexander.,Pei, Songfeng.,Hou, Peng-Xiang.,...&Bayer, Bernhard C..(2021).Aerosol Jet Printing of Graphene and Carbon Nanotube Patterns on Realistically Rugged Substrates.ACS OMEGA,13. |
| MLA | Kaindl, Reinhard,et al."Aerosol Jet Printing of Graphene and Carbon Nanotube Patterns on Realistically Rugged Substrates".ACS OMEGA (2021):13. |
入库方式： OAI收割
来源：金属研究所
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