中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Realization of 366 nm GaN/AlGaN single quantum well ultraviolet laser diodes with a reduction of carrier loss in the waveguide layers

文献类型:期刊论文

作者Yang, J.;   Wang, B. B.;   Zhao, D. G.;   Liu, Z. S.;   Liang, F.;   Chen, P.;   Zhang, Y. H.;   Zhang, Z. Z.
刊名JOURNAL OF APPLIED PHYSICS
出版日期2021
卷号130期号:17页码:173105
公开日期2021
源URL[http://ir.semi.ac.cn/handle/172111/30811]  
专题半导体研究所_光电子研究发展中心
推荐引用方式
GB/T 7714
Yang, J.; Wang, B. B.; Zhao, D. G.; Liu, Z. S.; Liang, F.; Chen, P.; Zhang, Y. H.; Zhang, Z. Z.. Realization of 366 nm GaN/AlGaN single quantum well ultraviolet laser diodes with a reduction of carrier loss in the waveguide layers[J]. JOURNAL OF APPLIED PHYSICS,2021,130(17):173105.
APA Yang, J.; Wang, B. B.; Zhao, D. G.; Liu, Z. S.; Liang, F.; Chen, P.; Zhang, Y. H.; Zhang, Z. Z..(2021).Realization of 366 nm GaN/AlGaN single quantum well ultraviolet laser diodes with a reduction of carrier loss in the waveguide layers.JOURNAL OF APPLIED PHYSICS,130(17),173105.
MLA Yang, J.; Wang, B. B.; Zhao, D. G.; Liu, Z. S.; Liang, F.; Chen, P.; Zhang, Y. H.; Zhang, Z. Z.."Realization of 366 nm GaN/AlGaN single quantum well ultraviolet laser diodes with a reduction of carrier loss in the waveguide layers".JOURNAL OF APPLIED PHYSICS 130.17(2021):173105.

入库方式: OAI收割

来源:半导体研究所

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