中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Study on the asymmetry of nanopore in Al droplet etching

文献类型:期刊论文

作者Shen, Jiaxin;   Lv, Hongliang;   Ni, Haiqiao;   Liu, Hanqing;   Su, Xiangbin;   Zhang, Jing;   Shang, Xiangjun;   Zhuo, Zhiyao;   Li, Shulun;   Chen, Yao;   Sun, Baoquan;   Zhang, Yu;   Niu, Zhichuan
刊名OPTICAL AND QUANTUM ELECTRONICS
出版日期2021
卷号53期号:8页码:412
语种英语
公开日期2021
源URL[http://ir.semi.ac.cn/handle/172111/30892]  
专题半导体研究所_半导体超晶格国家重点实验室
推荐引用方式
GB/T 7714
Shen, Jiaxin; Lv, Hongliang; Ni, Haiqiao; Liu, Hanqing; Su, Xiangbin; Zhang, Jing; Shang, Xiangjun; Zhuo, Zhiyao; Li, Shulun; Chen, Yao; Sun, Baoquan; Zhang, Yu; Niu, Zhichuan. Study on the asymmetry of nanopore in Al droplet etching[J]. OPTICAL AND QUANTUM ELECTRONICS,2021,53(8):412.
APA Shen, Jiaxin; Lv, Hongliang; Ni, Haiqiao; Liu, Hanqing; Su, Xiangbin; Zhang, Jing; Shang, Xiangjun; Zhuo, Zhiyao; Li, Shulun; Chen, Yao; Sun, Baoquan; Zhang, Yu; Niu, Zhichuan.(2021).Study on the asymmetry of nanopore in Al droplet etching.OPTICAL AND QUANTUM ELECTRONICS,53(8),412.
MLA Shen, Jiaxin; Lv, Hongliang; Ni, Haiqiao; Liu, Hanqing; Su, Xiangbin; Zhang, Jing; Shang, Xiangjun; Zhuo, Zhiyao; Li, Shulun; Chen, Yao; Sun, Baoquan; Zhang, Yu; Niu, Zhichuan."Study on the asymmetry of nanopore in Al droplet etching".OPTICAL AND QUANTUM ELECTRONICS 53.8(2021):412.

入库方式: OAI收割

来源:半导体研究所

浏览0
下载0
收藏0
其他版本

除非特别说明,本系统中所有内容都受版权保护,并保留所有权利。