Study on the asymmetry of nanopore in Al droplet etching
文献类型:期刊论文
作者 | Shen, Jiaxin; Lv, Hongliang; Ni, Haiqiao; Liu, Hanqing; Su, Xiangbin; Zhang, Jing; Shang, Xiangjun; Zhuo, Zhiyao; Li, Shulun; Chen, Yao; Sun, Baoquan; Zhang, Yu; Niu, Zhichuan |
刊名 | OPTICAL AND QUANTUM ELECTRONICS
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出版日期 | 2021 |
卷号 | 53期号:8页码:412 |
语种 | 英语 |
公开日期 | 2021 |
源URL | [http://ir.semi.ac.cn/handle/172111/30892] ![]() |
专题 | 半导体研究所_半导体超晶格国家重点实验室 |
推荐引用方式 GB/T 7714 | Shen, Jiaxin; Lv, Hongliang; Ni, Haiqiao; Liu, Hanqing; Su, Xiangbin; Zhang, Jing; Shang, Xiangjun; Zhuo, Zhiyao; Li, Shulun; Chen, Yao; Sun, Baoquan; Zhang, Yu; Niu, Zhichuan. Study on the asymmetry of nanopore in Al droplet etching[J]. OPTICAL AND QUANTUM ELECTRONICS,2021,53(8):412. |
APA | Shen, Jiaxin; Lv, Hongliang; Ni, Haiqiao; Liu, Hanqing; Su, Xiangbin; Zhang, Jing; Shang, Xiangjun; Zhuo, Zhiyao; Li, Shulun; Chen, Yao; Sun, Baoquan; Zhang, Yu; Niu, Zhichuan.(2021).Study on the asymmetry of nanopore in Al droplet etching.OPTICAL AND QUANTUM ELECTRONICS,53(8),412. |
MLA | Shen, Jiaxin; Lv, Hongliang; Ni, Haiqiao; Liu, Hanqing; Su, Xiangbin; Zhang, Jing; Shang, Xiangjun; Zhuo, Zhiyao; Li, Shulun; Chen, Yao; Sun, Baoquan; Zhang, Yu; Niu, Zhichuan."Study on the asymmetry of nanopore in Al droplet etching".OPTICAL AND QUANTUM ELECTRONICS 53.8(2021):412. |
入库方式: OAI收割
来源:半导体研究所
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