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The preparation of SiC ceramic photosensitive slurry for rapid stereolithography

文献类型：期刊论文

作者Tang, Jie1,5; Guo, Xiaotian1,5; Chang, Haotian1,5; Hu, Kehui2,4; Shen, Zhen3; Wang, Weixing; Liu, Meng1,5; Wei, Yuquan1,5; Huang, Zhengren1,5; Yang, Yong1,5
刊名JOURNAL OF THE EUROPEAN CERAMIC SOCIETY
出版日期2021-12-01
卷号41期号:15页码:7516-7524
关键词Stereolithography Graded SiO2 3D printing SiC ceramic slurry
ISSN号0955-2219
DOI10.1016/j.jeurceramsoc.2021.08.029
通讯作者Huang, Zhengren(zhrhuang@mail.sic.ac.cn) ; Yang, Yong(yangyong@mail.sic.ac.cn)
英文摘要Stereolithography is one of the most widely used additive manufacturing techniques for preparing high precision and complex ceramic components. Due to the high optical absorbance and refractive index of SiC powder, the rapid stereolithography of SiC ceramics components has become a key challenge. Here, we innovatively use graded silica to improve the curing thickness, rheological and settling performance of the slurry. And we presented a preparation method of SiC ceramic slurry for stereolithography with high solid content, low viscosity, low sedimentation rate and high curing thickness. The printable precision of the slurry is more than 75 mu m, the dynamic viscosity is less than 2 Pa.s, and the 24 h sedimentation height is less than 5%. This strategy demonstrates a tantalizing possibility and promising prospect to rapid stereolithography of large size SiC ceramic green body.
WOS关键词MATRIX COMPOSITES ; FABRICATION ; INFILTRATION ; SUSPENSIONS ; BEHAVIOR ; SPACE
资助项目Research instrument development project of Chinese Academy of Sciences[YZQT014]
WOS研究方向Materials Science
语种英语
WOS记录号WOS:000705188500005
出版者ELSEVIER SCI LTD
资助机构Research instrument development project of Chinese Academy of Sciences
源URL[http://ir.ia.ac.cn/handle/173211/46167]  
专题自动化研究所_复杂系统管理与控制国家重点实验室_先进控制与自动化团队
通讯作者Huang, Zhengren; Yang, Yong
作者单位1.Chinese Acad Sci, Shanghai Inst Ceram, State Key Lab High Performance Ceram & Superfine, Shanghai 200050, Peoples R China
2.Tsinghua Univ, State Key Lab Tribol, Beijing 100084, Peoples R China
3.Chinese Acad Sci, Inst Automat, State Key Lab Management & Control Complex Syst, Beijing, Peoples R China
4.Tsinghua Univ, Dept Mech Engn, Beijing 100084, Peoples R China
5.Univ Chinese Acad Sci, Coll Mat Sci & Optoelect Technol, Beijing 100049, Peoples R China
推荐引用方式
GB/T 7714		 Tang, Jie,Guo, Xiaotian,Chang, Haotian,et al. The preparation of SiC ceramic photosensitive slurry for rapid stereolithography[J]. JOURNAL OF THE EUROPEAN CERAMIC SOCIETY,2021,41(15):7516-7524.
APA Tang, Jie.,Guo, Xiaotian.,Chang, Haotian.,Hu, Kehui.,Shen, Zhen.,...&Yang, Yong.(2021).The preparation of SiC ceramic photosensitive slurry for rapid stereolithography.JOURNAL OF THE EUROPEAN CERAMIC SOCIETY,41(15),7516-7524.
MLA Tang, Jie,et al."The preparation of SiC ceramic photosensitive slurry for rapid stereolithography".JOURNAL OF THE EUROPEAN CERAMIC SOCIETY 41.15(2021):7516-7524.

入库方式： OAI收割

来源：自动化研究所

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