High pressure suppressing grain boundary migration in a nanograined nickel
文献类型：期刊论文
| 作者 | Guo, X. K.2,3; Dong, H. L.1; Luo, Z. P.3; Chen, Bin1; Li, X. Y.3 |
| 刊名 | SCRIPTA MATERIALIA
 |
| 出版日期 | 2022-06-01 |
| 卷号 | 214页码:6 |
| ISSN号 | 1359-6462 |
| 关键词 | Nanograined metals Grain boundary migration High pressure Deformation mechanism Partial dislocation |
| DOI | 10.1016/j.scriptamat.2022.114656 |
| 通讯作者 | Luo, Z. P.(zpluo@imr.ac.cn) |
| 英文摘要 | Grain boundaries (GBs) of nanograined metals are prone to migrate when subjected to mechanical loading. In this study, nanograined pure nickel samples with an average grain size of about 70 nm were deformed under pressure of 20 GPa and 43 GPa using a diamond anvil cell. It was found that the average grain size decreased slightly after high pressure compression, which meant high pressure suppressed the nanograin boundaries migration. Extensive extended dislocations with large dissociation width (averagely 5-6 nm) as well as LomerCottrell locks were observed in the high pressure deformed nanograined Ni, indicating that partial dislocation activities dominated the plastic deformation, which may facilitate to relax GBs and thus suppress GBs migration. The finding of this study may help to fabricate stable nanocrystalline metals. |
| 资助项目 | Ministry of Sci-ence & Technology of China[2017YFA0700700] ; Ministry of Sci-ence & Technology of China[2017YFA0204401] ; National Science Foundation of China[51701216] ; Liaoning Revitalization Talents Program[XLYC1808008] |
| WOS研究方向 | Science & Technology - Other Topics ; Materials Science ; Metallurgy & Metallurgical Engineering |
| 语种 | 英语 |
| 出版者 | PERGAMON-ELSEVIER SCIENCE LTD |
| WOS记录号 | WOS:000791254600002 |
| 资助机构 | Ministry of Sci-ence & Technology of China ; National Science Foundation of China ; Liaoning Revitalization Talents Program |
| 源URL | [http://ir.imr.ac.cn/handle/321006/173935]  |
| 专题 | 金属研究所_中国科学院金属研究所 |
| 通讯作者 | Luo, Z. P. |
| 作者单位 | 1.Ctr High Pressure Sci & Technol Adv Res, Shanghai 201203, Peoples R China 2.Univ Sci & Technol China, Sch Mat Sci & Engn, Hefei 230026, Peoples R China 3.Chinese Acad Sci, Inst Met Res, Shenyang Natl Lab Mat Sci, 72 Wenhua Rd, Shenyang 110016, Peoples R China |
| 推荐引用方式 GB/T 7714 | Guo, X. K.,Dong, H. L.,Luo, Z. P.,et al. High pressure suppressing grain boundary migration in a nanograined nickel[J]. SCRIPTA MATERIALIA,2022,214:6. |
| APA | Guo, X. K.,Dong, H. L.,Luo, Z. P.,Chen, Bin,&Li, X. Y..(2022).High pressure suppressing grain boundary migration in a nanograined nickel.SCRIPTA MATERIALIA,214,6. |
| MLA | Guo, X. K.,et al."High pressure suppressing grain boundary migration in a nanograined nickel".SCRIPTA MATERIALIA 214(2022):6. |
入库方式： OAI收割
来源：金属研究所
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