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Helium-ion-beam nanofabrication: extreme processes and applications

文献类型：期刊论文

作者He,Shixuan1,2; Tian,Rong1; Wu,Wei3; Li,Wen-Di4; Wang,Deqiang1
刊名International Journal of Extreme Manufacturing
出版日期2020-11-23
卷号3期号:1
关键词helium ion beam extreme nanofabrication direct writing nanostructures
ISSN号2631-8644
DOI10.1088/2631-7990/abc673
通讯作者Wang,Deqiang()
英文摘要Abstract Helium ion beam (HIB) technology plays an important role in the extreme fields of nanofabrication. This paper reviews the latest developments in HIB technology as well as its extreme processing capabilities and widespread applications in nanofabrication. HIB-based nanofabrication includes direct-write milling, ion beam- induced deposition, and direct-write lithography without resist assistance. HIB nanoscale applications have also been evaluated in the areas of integrated circuits, materials sciences, nano-optics, and biological sciences. This review covers four thematic applications of HIB: (1) helium ion microscopy imaging for biological samples and semiconductors; (2) HIB milling and swelling for 2D/3D nanopore fabrication; (3) HIB-induced deposition for nanopillars, nanowires, and 3D nanostructures; (4) additional HIB direct writing for resist, graphene, and plasmonic nanostructures. This paper concludes with a summary of potential future applications and areas of improvement for HIB extreme nanofabrication technology.
语种英语
WOS记录号IOP:IJEM_3_1_012001
出版者IOP Publishing
源URL[http://119.78.100.138/handle/2HOD01W0/14935]  
专题中国科学院重庆绿色智能技术研究院
通讯作者Wang,Deqiang
作者单位1.Chongqing Key Laboratory of Multi-scale Manufacturing Technology, Chongqing Institute of Green and Intelligent Technology, Chinese Academy of Sciences, Chongqing 400714, People’s Republic of China
2.College of Physics, Sichuan University, Chengdu, Sichuan 610065, People’s Republic of China
3.Department of Electrical Engineering, University of Southern California, Los Angeles, CA 90089, United States of America
4.Department of Mechanical Engineering, The University of Hong Kong, Pokfulam, Hong Kong, People’s Republic of China
推荐引用方式
GB/T 7714		 He,Shixuan,Tian,Rong,Wu,Wei,et al. Helium-ion-beam nanofabrication: extreme processes and applications[J]. International Journal of Extreme Manufacturing,2020,3(1).
APA He,Shixuan,Tian,Rong,Wu,Wei,Li,Wen-Di,&Wang,Deqiang.(2020).Helium-ion-beam nanofabrication: extreme processes and applications.International Journal of Extreme Manufacturing,3(1).
MLA He,Shixuan,et al."Helium-ion-beam nanofabrication: extreme processes and applications".International Journal of Extreme Manufacturing 3.1(2020).

入库方式： OAI收割

来源：重庆绿色智能技术研究院

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