Preparation and photoelectric characterization of p-GeSe/p-WS2 heterojunction devices
文献类型:期刊论文
作者 | Yan, Bing1,2; Zhang, Guoxin1,2; Ning, Bo1,3; Chen, Sikai1,3; Zhao, Yang1,3; Zhou, Dahua1; Shi, Xuan1; Shen, Jun1; Xiao, Zeyun1; Zhao, Hongquan1 |
刊名 | JOURNAL OF PHYSICS D-APPLIED PHYSICS |
出版日期 | 2022-08-11 |
卷号 | 55期号:32页码:9 |
ISSN号 | 0022-3727 |
关键词 | van der Waals heterojunction p-p type junction GeSe/WS2 optoelectronic properties |
DOI | 10.1088/1361-6463/ac6711 |
通讯作者 | Shi, Xuan(shixuan@cigit.ac.cn) ; Zhao, Hongquan(hqzhao@cigit.ac.cn) |
英文摘要 | The construction of van der Waals (vdW) heterojunctions has attracted widespread attention for various strategies in the optoelectronic field due to their band structural advantages. Herein, novel p-p heterojunctions based on p-GeSe and p-WS2 flakes are fabricated on 300 nm-SiO2/Si substrates by means of mechanical exfoliation and micro-area fixed-point transfer of the GeSe flakes onto the WS2 flakes. The thickness and quality of the materials are determined by atomic force microscope and Raman spectroscopy. Considerable photoelectric characteristics are exhibited by exploring the performance of the heterojunctions under a 635 nm laser illumination. The photoresponsivity (R-lambda), specific detectivity (D*), and external quantum efficiency (EQE) of the heterojunctions are measured to be 195.70 mA W-1, 2.879 x 10(7) Jones, and 38.28%, respectively. The results indicate the strong potential of the p-p type heterojunctions composed of GeSe and WS2 flakes in photoelectric devices, and our work provides parameters and technical support for the development of vdW heterojunction devices. |
资助项目 | National Science Foundation of China[61775214] ; National Science Foundation of China[61601433] ; Natural Science Foundation of Chongqing, China[cstc2019jcyj-zdxmX0003] ; Natural Science Foundation of Chongqing, China[cstc2019jcyj-msxmX0387] ; Project of Chongqing Talents[CQYC202002064] ; Youth Innovation Promotion Association CAS |
WOS研究方向 | Physics |
语种 | 英语 |
出版者 | IOP Publishing Ltd |
WOS记录号 | WOS:000799595400001 |
源URL | [http://119.78.100.138/handle/2HOD01W0/15891] |
专题 | 中国科学院重庆绿色智能技术研究院 |
通讯作者 | Shi, Xuan; Zhao, Hongquan |
作者单位 | 1.Chinese Acad Sci, Chongqing Inst Green & Intelligent Technol, Chongqing 400714, Peoples R China 2.Univ Chinese Acad Sci, Chongqing Sch, Chongqing 400714, Peoples R China 3.Chongqing Univ Posts & Telecommun, Coll Optoelect Engn, Chongqing 400065, Peoples R China |
推荐引用方式 GB/T 7714 | Yan, Bing,Zhang, Guoxin,Ning, Bo,et al. Preparation and photoelectric characterization of p-GeSe/p-WS2 heterojunction devices[J]. JOURNAL OF PHYSICS D-APPLIED PHYSICS,2022,55(32):9. |
APA | Yan, Bing.,Zhang, Guoxin.,Ning, Bo.,Chen, Sikai.,Zhao, Yang.,...&Zhao, Hongquan.(2022).Preparation and photoelectric characterization of p-GeSe/p-WS2 heterojunction devices.JOURNAL OF PHYSICS D-APPLIED PHYSICS,55(32),9. |
MLA | Yan, Bing,et al."Preparation and photoelectric characterization of p-GeSe/p-WS2 heterojunction devices".JOURNAL OF PHYSICS D-APPLIED PHYSICS 55.32(2022):9. |
入库方式: OAI收割
来源:重庆绿色智能技术研究院
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