中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Topological hall transport: Materials, mechanisms and potential applications

文献类型:期刊论文

作者Wang, Han1,2; Dai, Yingying1; Chow, Gan-Moog2; Chen, Jingsheng2
刊名PROGRESS IN MATERIALS SCIENCE
出版日期2022-10-01
卷号130页码:47
ISSN号0079-6425
关键词Topological Hall effect Topological states Magnetic skyrmion Dzyaloshinskii -Moriya interaction Inversion symmetry breaking Magnetic multilayers
DOI10.1016/j.pmatsci.2022.100971
通讯作者Chen, Jingsheng(msecj@nus.edu.sg)
英文摘要Topological Hall effect (THE) and its inverse effect (skyrmion Hall effect) generally occurs in magnetic materials with topological properties, as a consequence of nonuniform and noncollinear magnetization as well as special chirality. Its mechanism and properties are different from those of conventional anomalous Hall effect induced by uniform magnetization. Following the seminal theoretical model of THE, the experimental research of THE has achieved the significant progress in the development of magnetic topological state (magnetic vortex, meron, skyrmion) and spintronics in the past decade. In this topical review, we focus on the recent experimental progress in the observation of THE and various theoretical understandings. The first part introduces the phenomenological description of THE commonly observed in experiments. Next, we present a survey of different materials hosting THE and summarize the relevant theories of THE as well as the approach of tuning THE. Finally, we will conclude our review by summarizing the present status and the perspective of the field.
资助项目A*STAR[A1983c0036] ; A*STAR[IAF-ICP 11801E0036] ; RIE2020 Advanced Manufacturing and Engineering (AME)[A20G9b0135] ; Singapore Ministry of Education[MOE2018-T2-2-043] ; Singapore Ministry of Education[MOE-T2EP50121-0011] ; Singapore Ministry of Education[MOE Tier 1 22-4888-A0001] ; National Natural Science Foundation of China[51590883] ; National Natural Science Foundation of China[51701217] ; Young Talent Program of SYNL
WOS研究方向Materials Science
语种英语
出版者PERGAMON-ELSEVIER SCIENCE LTD
WOS记录号WOS:000815774200001
资助机构A*STAR ; RIE2020 Advanced Manufacturing and Engineering (AME) ; Singapore Ministry of Education ; National Natural Science Foundation of China ; Young Talent Program of SYNL
源URL[http://ir.imr.ac.cn/handle/321006/174934]  
专题金属研究所_中国科学院金属研究所
通讯作者Chen, Jingsheng
作者单位1.Chinese Acad Sci, Inst Met Res, Shenyang Natl Lab Mat Sci, Shenyang 110016, Peoples R China
2.Natl Univ Singapore, Dept Mat Sci & Engn, Singapore 117575, Singapore
推荐引用方式
GB/T 7714
Wang, Han,Dai, Yingying,Chow, Gan-Moog,et al. Topological hall transport: Materials, mechanisms and potential applications[J]. PROGRESS IN MATERIALS SCIENCE,2022,130:47.
APA Wang, Han,Dai, Yingying,Chow, Gan-Moog,&Chen, Jingsheng.(2022).Topological hall transport: Materials, mechanisms and potential applications.PROGRESS IN MATERIALS SCIENCE,130,47.
MLA Wang, Han,et al."Topological hall transport: Materials, mechanisms and potential applications".PROGRESS IN MATERIALS SCIENCE 130(2022):47.

入库方式: OAI收割

来源:金属研究所

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