Nano dual-phase CuNiTiNbCr high entropy alloy films produced by high-power pulsed magnetron sputtering
文献类型:期刊论文
作者 | Li, Yantao; Wang, Chunting; Ma, Donglin; Zeng, Xiaokang; Liu, Mao; Jiang, X.; Leng, Y. X. |
刊名 | SURFACE & COATINGS TECHNOLOGY
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出版日期 | 2021 |
卷号 | 420 |
关键词 | DEPOSITION-RATE MICROSTRUCTURE TEMPERATURE COATINGS BEHAVIOR GROWTH |
英文摘要 | Dual-phase high entropy alloys have been proved to have the ability to overcome the strength-ductility trade-off. However, high-entropy alloy films are difficult to obtain a dual-phase structure due to the extremely high cooling rate during the preparation process and the high-entropy effect of the film itself. In this paper, the dual-phase CuNiTiNbCr high-entropy alloy films were prepared by high-power pulsed magnetron sputtering at different working pressures. The composition, microstructures, mechanical properties and electrochemical corrosion performance were tested by energy dispersive spectroscopy (EDS), scanning electron microscopy (SEM), X-ray diffraction (XRD), transmission electron microscopy (TEM), nano-indentation, Vickers indentation and electrochemical polarization. The CuNiTiNbCr films exhibited a dual-phase structure composed of FCC matrix phase and Cu-rich BCC precipitated phase. The film presented a two-layer structure, the single FCC phase structure near the substrate and the FCC + BCC structure above. Comparing with FCC phase, the dual-phase structure exhibited higher hardness. With the increase of deposition pressure, the structure of the film became looser, and the hardness, toughness and corrosion resistance were all decreased due to the influence of the structure. It is proved that high-power pulsed magnetron sputtering is a feasible way for the phase structure regulation and performance improvement of high-entropy alloy films. |
源URL | [http://ir.nimte.ac.cn/handle/174433/21638] ![]() |
专题 | 中国科学院宁波材料技术与工程研究所 2021专题_期刊论文 |
作者单位 | Jiang, X (corresponding author), Southwest Jiaotong Univ, Sch Mat Sci & Engn, Key Lab Adv Technol Mat, Minist Educ, Chengdu 610031, Peoples R China. |
推荐引用方式 GB/T 7714 | Li, Yantao,Wang, Chunting,Ma, Donglin,et al. Nano dual-phase CuNiTiNbCr high entropy alloy films produced by high-power pulsed magnetron sputtering[J]. SURFACE & COATINGS TECHNOLOGY,2021,420. |
APA | Li, Yantao.,Wang, Chunting.,Ma, Donglin.,Zeng, Xiaokang.,Liu, Mao.,...&Leng, Y. X..(2021).Nano dual-phase CuNiTiNbCr high entropy alloy films produced by high-power pulsed magnetron sputtering.SURFACE & COATINGS TECHNOLOGY,420. |
MLA | Li, Yantao,et al."Nano dual-phase CuNiTiNbCr high entropy alloy films produced by high-power pulsed magnetron sputtering".SURFACE & COATINGS TECHNOLOGY 420(2021). |
入库方式: OAI收割
来源:宁波材料技术与工程研究所
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