Crystal Orientation-Dependent Oxidation of Epitaxial TiN Films with Tunable Plasmonics
文献类型：期刊论文
| 作者 | Zhang, Ruyi; Ma, Qian-Ying; Liu, Haigang; Sun, Tian-Yu; Bi, Jiachang; Song, Yang; Peng, Shaoqin; Liang, Lingyan; Gao, Junhua; Cao, Hongtao |
| 刊名 | ACS PHOTONICS
 |
| 出版日期 | 2021 |
| 卷号 | 8期号:3页码:847-856 |
| 英文摘要 | Titanium nitride (TiN) is a paradigm of refractory transition metal nitrides with great potential in vast applications. Generally, the plasmonic performance of TiN can be tuned by oxidation, which was thought to be only temperature-, oxygen partial pressure-, and time-dependent. Regarding the role of crystallographic orientation in the oxidation and resultant optical properties of TiN films, little is known thus far. Here we reveal that both the oxidation resistance behavior and the plasmonic performance of epitaxial TiN films follow the order of (001) < (110) < (111). The effects of crystallographic orientation on the lattice constants, optical properties, and oxidation levels of epitaxial TiN films have been systematically studied by combined high-resolution X-ray diffraction, spectroscopic ellipsometry, X-ray absorption spectroscopy, and X-ray photoemission spectroscopy. To further understand the role of crystallographic orientation in the initial oxidation process of TiN films, density-functional-theory calculations are carried out, indicating the energy cost of oxidation is (001) < (110) < (111), consistent with the experiments. The superior endurance of the (111) orientation against mild oxidation can largely alleviate the previously stringent technical requirements for the growth of TiN films with high plasmonic performance. The crystallographic orientation can also offer an effective controlling parameter to design TiN-based plasmonic devices with desired peculiarity, for example, superior chemical stability against mild oxidation or large optical tunability upon oxidation. |
| 源URL | [http://ir.nimte.ac.cn/handle/174433/22087]  |
| 专题 | 中国科学院宁波材料技术与工程研究所 2021专题_期刊论文 |
| 作者单位 | 1.Cao, YW (corresponding author), Univ Chinese Acad Sci, Ctr Mat Sci & Optoelect Engn, Beijing 100049, Peoples R China. 2.Cao, YW (corresponding author), Chinese Acad Sci, Ningbo Inst Mat Technol & Engn, Ningbo 315201, Peoples R China. 3.Gao, JH 4.Huang, LF |
| 推荐引用方式 GB/T 7714 | Zhang, Ruyi,Ma, Qian-Ying,Liu, Haigang,et al. Crystal Orientation-Dependent Oxidation of Epitaxial TiN Films with Tunable Plasmonics[J]. ACS PHOTONICS,2021,8(3):847-856. |
| APA | Zhang, Ruyi.,Ma, Qian-Ying.,Liu, Haigang.,Sun, Tian-Yu.,Bi, Jiachang.,...&Cao, Yanwei.(2021).Crystal Orientation-Dependent Oxidation of Epitaxial TiN Films with Tunable Plasmonics.ACS PHOTONICS,8(3),847-856. |
| MLA | Zhang, Ruyi,et al."Crystal Orientation-Dependent Oxidation of Epitaxial TiN Films with Tunable Plasmonics".ACS PHOTONICS 8.3(2021):847-856. |
入库方式： OAI收割
来源：宁波材料技术与工程研究所
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