Application of Atomic Layer Deposition in Dye-Sensitized Photoelectrosynthesis Cells
文献类型：期刊论文
| 作者 | Wang, Degao; Huang, Qing; Shi, Weiqun; You, Wei; Meyer, Thomas J. |
| 刊名 | TRENDS IN CHEMISTRY
 |
| 出版日期 | 2021 |
| 卷号 | 3期号:1 |
| 关键词 | MOLECULAR WATER-OXIDATION INTERFACIAL ELECTRON-TRANSFER METAL-OXIDE SURFACES SOLAR-CELLS RECOMBINATION DYNAMICS ARTIFICIAL PHOTOSYNTHESIS CHARGE-SEPARATION HIGHLY EFFICIENT SINGLE-SITE TANDEM CELL |
| 英文摘要 | Atomic layer deposition (ALD) has been extensively used in the modification of semiconductor surfaces for scientific and industrial applications. It employs labile organometallic precursors that add to the surface layers of solids in a vacuum that are subsequently activated by surface hydrolysis. In recent applications, it has been used in the preparation of electrodes for molecularly based dye-sensitized solar cells (DSSCs) and dye-sensitized photoelectrosynthesis cells (DSPECs) for solar energy conversion. This review focuses on applications of ALD in DSPECs for the preparation of solar fuels based on modified semiconductor surfaces. In this area, ALD has been used to prepare core/shell structures that modify surface-interfacial electron transfer, to prepare structures that stabilize surface-bound chromophores and catalysts, and for the preparation of overlayer structures that stabilize electrodes for water oxidation and photocathodes for H-2 or CO2 reduction. |
| 源URL | [http://ir.nimte.ac.cn/handle/174433/22343]  |
| 专题 | 中国科学院宁波材料技术与工程研究所 2021专题_期刊论文 |
| 作者单位 | 1.Wang, DG 2.You, W 3.Meyer, TJ (corresponding author), Univ N Carolina, Dept Chem, Chapel Hill, NC 27599 USA. 4.Wang, DG (corresponding author), Chinese Acad Sci, Ningbo Inst Ind Technol, Engn Lab Adv Energy Mat, Ningbo 315201, Zhejiang, Peoples R China. 5.Wang, DG (corresponding author), CNiTECH, Qianwan Inst, Zhongchuangyi Rd, Hangzhou 315336, Zhejiang, Peoples R China. |
| 推荐引用方式 GB/T 7714 | Wang, Degao,Huang, Qing,Shi, Weiqun,et al. Application of Atomic Layer Deposition in Dye-Sensitized Photoelectrosynthesis Cells[J]. TRENDS IN CHEMISTRY,2021,3(1). |
| APA | Wang, Degao,Huang, Qing,Shi, Weiqun,You, Wei,&Meyer, Thomas J..(2021).Application of Atomic Layer Deposition in Dye-Sensitized Photoelectrosynthesis Cells.TRENDS IN CHEMISTRY,3(1). |
| MLA | Wang, Degao,et al."Application of Atomic Layer Deposition in Dye-Sensitized Photoelectrosynthesis Cells".TRENDS IN CHEMISTRY 3.1(2021). |
入库方式： OAI收割
来源：宁波材料技术与工程研究所
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