Growth of wrinkle-free and ultra-flat Bi-layer graphene on sapphire substrate using Cu sacrificial layer
文献类型：期刊论文
| 作者 | Lou, Gang; Ouyang, Yi; Xie, Ying; Wang, Wei; Liu, Zhaoping |
| 刊名 | NANOTECHNOLOGY
 |
| 出版日期 | 2021 |
| 卷号 | 32期号:47 |
| 关键词 | WAFER-SCALE GRAPHENE HIGH-QUALITY COPPER FILMS |
| 英文摘要 | The transfer process of chemical vapor deposition graphene film leads to unavoidable crack, wrinkles, doping, and contamination, which limits its function to establish stable and high-performance devices. It raises a growing interest to fabricate high-quality graphene on the target substrate directly. Here, bi-layer graphene (BLG) film can be grown on sapphire substrate by a Cu sacrificial layer using atmospheric-pressure chemical vapor deposition. The as-obtained BLG at the interface between sapphire and Cu layer is free of wrinkles, and the corresponding surface roughness Ra is as low as 0.66 nm. The square resistance of the graphene is 898.1 ohm sq(-1), which is the lowest among the records of graphene film directly grown on nonmetal substrates. |
| 源URL | [http://ir.nimte.ac.cn/handle/174433/21302]  |
| 专题 | 2021专题_期刊论文 |
| 作者单位 | 1.Wang, W 2.Liu, ZP (corresponding author), Chinese Acad Sci, Ningbo Inst Mat Technol & Engn, Key Lab Graphene Technol & Applicat Zhejiang Prov, CAS Engn Lab Graphene, Ningbo 315201, Zhejiang, Peoples R China. |
| 推荐引用方式 GB/T 7714 | Lou, Gang,Ouyang, Yi,Xie, Ying,et al. Growth of wrinkle-free and ultra-flat Bi-layer graphene on sapphire substrate using Cu sacrificial layer[J]. NANOTECHNOLOGY,2021,32(47). |
| APA | Lou, Gang,Ouyang, Yi,Xie, Ying,Wang, Wei,&Liu, Zhaoping.(2021).Growth of wrinkle-free and ultra-flat Bi-layer graphene on sapphire substrate using Cu sacrificial layer.NANOTECHNOLOGY,32(47). |
| MLA | Lou, Gang,et al."Growth of wrinkle-free and ultra-flat Bi-layer graphene on sapphire substrate using Cu sacrificial layer".NANOTECHNOLOGY 32.47(2021). |
入库方式： OAI收割
来源：宁波材料技术与工程研究所
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