中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Differences in etching characteristics of TMAH and KOH on preparing inverted pyramids for silicon solar cells

文献类型:期刊论文

作者Fan, Yujie ; Han, Peide ; Liang, Peng ; Xing, Yupeng ; Ye, Zhou ; Hu, Shaoxu
刊名applied surface science
出版日期2013
卷号264页码:761-766
学科主题光电子学
收录类别SCI
语种英语
公开日期2013-10-10
源URL[http://ir.semi.ac.cn/handle/172111/24442]  
专题半导体研究所_集成光电子学国家重点实验室
推荐引用方式
GB/T 7714
Fan, Yujie,Han, Peide,Liang, Peng,et al. Differences in etching characteristics of TMAH and KOH on preparing inverted pyramids for silicon solar cells[J]. applied surface science,2013,264:761-766.
APA Fan, Yujie,Han, Peide,Liang, Peng,Xing, Yupeng,Ye, Zhou,&Hu, Shaoxu.(2013).Differences in etching characteristics of TMAH and KOH on preparing inverted pyramids for silicon solar cells.applied surface science,264,761-766.
MLA Fan, Yujie,et al."Differences in etching characteristics of TMAH and KOH on preparing inverted pyramids for silicon solar cells".applied surface science 264(2013):761-766.

入库方式: OAI收割

来源:半导体研究所

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