Influence of substrate bias on microstructure and morphology of ZrN thin films deposited by arc ion plating
文献类型：期刊论文
| 作者 | Zhang Min1,2; Hu Xiao-gang1; Yang Xiao-xu1; Xu Fei-fei1; Kim, Kwang-ho3; Shao Zhi-gang2 |
| 刊名 | transactions of nonferrous metals society of china
 |
| 出版日期 | 2012-10-01 |
| 卷号 | 22页码:s115-s119 |
| 关键词 | zirconium nitride (ZrN) thin film arc ion plating substrate bias microstructure |
| 产权排序 | 2,1 |
| 通讯作者 | 张敏 ; kwanghokim |
| 英文摘要 | zirconium nitride thin films were fabricated using arc ion plating under negative substrate biases to investigate the influence of substrate bias on the zrn films. the phase, composition, and surface morphology of the zrn films, with respect to substrate bias, were studied by xrd, epma, and fe-sem, respectively. the results show that cubic zrn and hexagonal zr phases form in the zrn films. the competition between surface energy and strain energy makes the preferred orientation change from (111) to (200) and then back to highly (111) preferred orientation as a function of substrate bias. with the increase of bias voltage, the crystallite size of zrn films reduces from 30 to 15 nm. meanwhile, the film microstructure evolves from an apparent columnar structure to a highly dense equiaxed structure, indicating that the ion bombardment enhanced by substrate bias can suppress the columnar growth in the zrn films. deposition rate and mole ratio of zr to n increase with the increase of bias voltage and reach the maximum at -50 v, and then show a decline trend when bias voltage further increases. |
| WOS标题词 | science & technology ; technology |
| 学科主题 | 物理化学 |
| 类目[WOS] | metallurgy & metallurgical engineering |
| 研究领域[WOS] | metallurgy & metallurgical engineering |
| 关键词[WOS] | mechanical-properties ; coatings ; hardness ; voltage |
| 收录类别 | SCI |
| 语种 | 英语 |
| WOS记录号 | WOS:000310567300020 |
| 公开日期 | 2013-10-11 |
| 源URL | [http://159.226.238.44/handle/321008/117849]  |
| 专题 | 大连化学物理研究所_中国科学院大连化学物理研究所 |
| 作者单位 | 1.Liaoning Normal Univ, Sch Phys & Elect Technol, Dalian 116029, Peoples R China 2.Chinese Acad Sci, Dalian Inst Chem Phys, Fuel Cell Syst & Engn Lab, Dalian 116023, Peoples R China 3.Pusan Natl Univ, Sch Mat Sci & Engn, Pusan 609735, South Korea |
| 推荐引用方式 GB/T 7714 | Zhang Min,Hu Xiao-gang,Yang Xiao-xu,et al. Influence of substrate bias on microstructure and morphology of ZrN thin films deposited by arc ion plating[J]. transactions of nonferrous metals society of china,2012,22:s115-s119. |
| APA | Zhang Min,Hu Xiao-gang,Yang Xiao-xu,Xu Fei-fei,Kim, Kwang-ho,&Shao Zhi-gang.(2012).Influence of substrate bias on microstructure and morphology of ZrN thin films deposited by arc ion plating.transactions of nonferrous metals society of china,22,s115-s119. |
| MLA | Zhang Min,et al."Influence of substrate bias on microstructure and morphology of ZrN thin films deposited by arc ion plating".transactions of nonferrous metals society of china 22(2012):s115-s119. |
入库方式： OAI收割
来源：大连化学物理研究所
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