A RF plasma source with focused magnetic field for material treatment
文献类型：期刊论文
| 作者 | Zhang, L. P.1,3; Chang, L.1,2,3; Yuan, X. G.1,3; Zhang, J. H.1,3; Zhou, H. S.1,3; Luo, G. N.1,3 |
| 刊名 | PLASMA CHEMISTRY AND PLASMA PROCESSING
 |
| 出版日期 | 2022-11-17 |
| ISSN号 | 0272-4324 |
| 关键词 | Helicon plasma Focused magnetic field IEDF EEDF |
| DOI | 10.1007/s11090-022-10300-z |
| 通讯作者 | Chang, L.(leichang@cqu.edu.cn) |
| 英文摘要 | To increase the particle flux for material treatment, a RF plasma source driven by helicon antenna is constructed with focused magnetic field. The source is located coaxially outside a two-solenoid magnetic system, and the location is adjustable that making it convenient to shape the magnetic geometry involved. RF compensated Langmuir probe and retarding potential analyser are employed to measure the electron density and temperature and the energy distribution functions of electrons and ions. The presence of two groups of electrons is reported of the first time to our knowledge, and is important not only for the practical applications but also for the clarification of the fundamental model of the helicon discharge. Measurement data are obtained at two axial locations: near the antenna (source region) and far away from the antenna (target region), which thereby show the decaying and shrinking features of plasma plume. It shows that the plasma source is a promising candidate for material treatment. |
| WOS关键词 | ENERGY DISTRIBUTION FUNCTION ; HELICONS |
| 资助项目 | Chinese Academy of Sciences 100 Talent Program ; Science Foundation of Institute of Plasma Physics[DSJJ-2020-07] ; Fundamental Research Funds for the Central Universities[2022CDJQY-003] ; Chongqing Entrepreneurship and Innovation Support Program for Overseas Returnees[cx2022004] |
| WOS研究方向 | Engineering ; Physics |
| 语种 | 英语 |
| 出版者 | SPRINGER |
| WOS记录号 | WOS:000884953600002 |
| 资助机构 | Chinese Academy of Sciences 100 Talent Program ; Science Foundation of Institute of Plasma Physics ; Fundamental Research Funds for the Central Universities ; Chongqing Entrepreneurship and Innovation Support Program for Overseas Returnees |
| 源URL | [http://ir.hfcas.ac.cn:8080/handle/334002/130429]  |
| 专题 | 中国科学院合肥物质科学研究院 |
| 通讯作者 | Chang, L. |
| 作者单位 | 1.Chinese Acad Sci, Inst Plasma Phys, HFIPS, Hefei 230031, Peoples R China 2.Chongqing Univ, State Key Lab Power Transmiss Equipment & Syst Se, Chongqing 400044, Peoples R China 3.Univ Sci & Technol China, Sci Isl Branch Grad, Hefei 230026, Peoples R China |
| 推荐引用方式 GB/T 7714 | Zhang, L. P.,Chang, L.,Yuan, X. G.,et al. A RF plasma source with focused magnetic field for material treatment[J]. PLASMA CHEMISTRY AND PLASMA PROCESSING,2022. |
| APA | Zhang, L. P.,Chang, L.,Yuan, X. G.,Zhang, J. H.,Zhou, H. S.,&Luo, G. N..(2022).A RF plasma source with focused magnetic field for material treatment.PLASMA CHEMISTRY AND PLASMA PROCESSING. |
| MLA | Zhang, L. P.,et al."A RF plasma source with focused magnetic field for material treatment".PLASMA CHEMISTRY AND PLASMA PROCESSING (2022). |
入库方式： OAI收割
来源：合肥物质科学研究院
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