Homogeneous Fluorine Distribution in Graphene through Thermal Dissociation of Molecular F-2: Implications for Thermal Conduction and Electrical Insulation
文献类型:期刊论文
作者 | Huang, Benyuan1; Liu, Yang1; Duan, Jiawei1; Li, Xin1; Li, Yulong1; Qin, Rui1; Wang, Xu1; Zhuang, Yongbing2; Liu, Xiangyang1 |
刊名 | ACS APPLIED NANO MATERIALS
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出版日期 | 2022-05-27 |
卷号 | 5期号:5页码:6770-6780 |
关键词 | graphene atomic fluorination fluorination mechanism fluorine distribution thermal conduction |
DOI | 10.1021/acsanm.2c00768 |
英文摘要 | Direct fluorination utilizing F-2/N-2 was confirmed to be one of the most efficient approaches to decorate graphene. The conventional opinion holds the view that direct fluorination is a molecular fluorination process, which often makes for the preparation of fluorinated graphene (FG) with heterogenous fluorine distribution. Herein, a fluorination strategy with an atomic fluorination mechanism was developed to modify graphene through thermal predissociation of molecular fluorine into atomic fluorine. By means of theoretical simulation, the thermal dissociation process of F-2 was disclosed, and dissociation temperature was determined to be about 140-180 degrees C. Consequently, an ingenious thermal annealing at 180 degrees C was employed to splitting F-2 into fluorine atoms before the fluorination reaction. Distinguished from the traditional molecular fluorination, atomic fluorination using fluorine atoms enables the preparation of FG with a higher fluorination degree and relatively homogeneous fluorine distribution because of the zero-energy barrier reaction, which was validated by aberration-corrected transmission electron microscopy directly. Furthermore, FG with homogeneous fluorine distribution possesses several advantages over the heterogenous fluorine distribution samples including higher thermal stability, higher thermal conductivity, and better electrical insulation, thereby demonstrating the possibility of their application in the field of thermal conduction and electrical insulation for microelectronics. We believe that this unique fluorination approach and corresponding mechanism can be extended to other carbon materials. |
WOS关键词 | MAGNETIC-PROPERTIES ; ENERGY ; CHEMISTRY |
资助项目 | National Natural Science Foundation of China[52003172] ; National Natural Science Foundation of China[51873113] ; Fundamental Research Funds for the Central Universities |
WOS研究方向 | Science & Technology - Other Topics ; Materials Science |
语种 | 英语 |
WOS记录号 | WOS:000833967000081 |
出版者 | AMER CHEMICAL SOC |
资助机构 | National Natural Science Foundation of China ; Fundamental Research Funds for the Central Universities |
源URL | [http://ir.ipe.ac.cn/handle/122111/54359] ![]() |
专题 | 中国科学院过程工程研究所 |
通讯作者 | Liu, Yang; Liu, Xiangyang |
作者单位 | 1.Sichuan Univ, Coll Polymer Sci & Engn, State Key Lab Polymer Mat & Engn, Chengdu 610065, Peoples R China 2.Univ Chinese Acad Sci, Chinese Acad Sci, Inst Proc Engn, State Key Lab Biochem Engn, Beijing 100190, Peoples R China |
推荐引用方式 GB/T 7714 | Huang, Benyuan,Liu, Yang,Duan, Jiawei,et al. Homogeneous Fluorine Distribution in Graphene through Thermal Dissociation of Molecular F-2: Implications for Thermal Conduction and Electrical Insulation[J]. ACS APPLIED NANO MATERIALS,2022,5(5):6770-6780. |
APA | Huang, Benyuan.,Liu, Yang.,Duan, Jiawei.,Li, Xin.,Li, Yulong.,...&Liu, Xiangyang.(2022).Homogeneous Fluorine Distribution in Graphene through Thermal Dissociation of Molecular F-2: Implications for Thermal Conduction and Electrical Insulation.ACS APPLIED NANO MATERIALS,5(5),6770-6780. |
MLA | Huang, Benyuan,et al."Homogeneous Fluorine Distribution in Graphene through Thermal Dissociation of Molecular F-2: Implications for Thermal Conduction and Electrical Insulation".ACS APPLIED NANO MATERIALS 5.5(2022):6770-6780. |
入库方式: OAI收割
来源:过程工程研究所
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