中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Numerical simulation of the argon dielectric barrier discharge driven by dual frequency at atmospheric pressure

文献类型:期刊论文

作者Qi, Bing4,5,6,7; Tian, Xiao3; Zhang, Tao2; Wang, Jing1; Wang, Yishan5,7; Si, Jinhai6; Tang, Jie5,7
刊名AIP ADVANCES
出版日期2023-06-01
卷号13期号:6
ISSN号2158-3226
DOI10.1063/5.0152839
产权排序1
英文摘要

Argon dielectric barrier discharge driven by the dual frequency at atmospheric pressure has been investigated by a 1D fluid model. Temporal evolutions of voltage and charge density on dielectric surface, fluxes of electrons and ions on the surface, the spatiotemporal distribution of electron generation rate, and the spatial distribution of electron density are studied with various low-frequency (LF) voltages. Minimum sustained discharge amplitude of high frequency (HF) voltage and spatiotemporal mean electron density over one LF period varying with sheath voltage (a ? ?) are also discussed. Results show that in a mode, the electron flux on the dielectric surface decreases significantly when the LF voltage amplitude is lower while the ion flux is less affected. The positive charge density on the surface increases, causing the surface voltage waveform to shift upward. When the LF voltage amplitude is 40 V and that of HF voltage is 87 V, the positive and negative values of voltage amplitude of dielectric surface are 182 and 32 V. As the LF voltage amplitude increases further, the sheath formation time is significantly delayed and the discharge terminates, and the rate of electron generation decreases significantly. The discharge is extinguished when the amplitude of LF voltage is 68 V while it regains when the amplitude reaches up to 750 V. In ? mode, when the amplitude of HF voltage reaches or exceeds its minimum sustained discharge value, the generation and distribution of electrons are almost unaffected by the amplitude of LF voltage.

语种英语
WOS记录号WOS:001012227700009
出版者AIP Publishing
源URL[http://ir.opt.ac.cn/handle/181661/96654]  
专题西安光学精密机械研究所_瞬态光学技术国家重点实验室
通讯作者Tang, Jie
作者单位1.Henan Agr Univ, Coll Sci, Zhengzhou 450002, Peoples R China
2.Xian Univ Sci & Technol, Coll Mat Sci & Engn, Xian 710054, Peoples R China
3.Xian Aeronaut Inst, Coll Sci, Xian 710077, Peoples R China
4.Xian Univ Sci & Technol, Coll Sci, Xian 710054, Peoples R China
5.Univ Chinese Acad Sci, Beijing 100049, Peoples R China
6.Xi An Jiao Tong Univ, Sch Elect Sci & Engn, Shaanxi Key Lab Informat Photon Tech, Xian 710049, Peoples R China
7.Chinese Acad Sci, Xian Inst Opt & Precis Mech, State Key Lab Transient Opt & Photon, Xian 710119, Peoples R China
推荐引用方式
GB/T 7714
Qi, Bing,Tian, Xiao,Zhang, Tao,et al. Numerical simulation of the argon dielectric barrier discharge driven by dual frequency at atmospheric pressure[J]. AIP ADVANCES,2023,13(6).
APA Qi, Bing.,Tian, Xiao.,Zhang, Tao.,Wang, Jing.,Wang, Yishan.,...&Tang, Jie.(2023).Numerical simulation of the argon dielectric barrier discharge driven by dual frequency at atmospheric pressure.AIP ADVANCES,13(6).
MLA Qi, Bing,et al."Numerical simulation of the argon dielectric barrier discharge driven by dual frequency at atmospheric pressure".AIP ADVANCES 13.6(2023).

入库方式: OAI收割

来源:西安光学精密机械研究所

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