中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Research on efficient and stable control of EUV-induced hydrogen plasma

文献类型:期刊论文

作者Q. J. Mao; X. P. Gong; Q. P. Lu; Y. Song; D. Z. Wang; Y. Bai and T. Y. Ma
刊名Journal of Applied Physics
出版日期2022
卷号131期号:23页码:9
ISSN号0021-8979
DOI10.1063/5.0088669
英文摘要We use the numerical model to study the control method for the ion sputter flux and energy at the surface of multilayer mirrors in hydrogen plasmas induced by extreme ultraviolet (EUV) radiation. This plasma is generated via photoionization by EUV photons with wavelengths at 13.5 nm and collision ionization by high-energy electrons. An electric field is formed by applying different bias voltages to the cylindrically symmetrical cavity and sample holder, which guides the transfer of charged particles and increases their energy. The evolution of pulsed EUV-induced plasma under the field is described by a two-dimension particle-in-cell model and the Monte Carlo simulation to represent collisions between charged particles and background molecules. The results show that the distribution of the electric field varies during the pulse and point out that the secondary electrons, which gain energy from the varying field and generate more plasma by collisions with hydrogen molecules, are crucial plasma sources in this scheme. We then propose a stable and efficient control method for EUV-induced hydrogen plasma by optimizing the cavity structure as an ellipsoid and treating the surface of the cavity in contact with the plasma.
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语种英语
源URL[http://ir.ciomp.ac.cn/handle/181722/67038]  
专题中国科学院长春光学精密机械与物理研究所
推荐引用方式
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Q. J. Mao,X. P. Gong,Q. P. Lu,et al. Research on efficient and stable control of EUV-induced hydrogen plasma[J]. Journal of Applied Physics,2022,131(23):9.
APA Q. J. Mao,X. P. Gong,Q. P. Lu,Y. Song,D. Z. Wang,&Y. Bai and T. Y. Ma.(2022).Research on efficient and stable control of EUV-induced hydrogen plasma.Journal of Applied Physics,131(23),9.
MLA Q. J. Mao,et al."Research on efficient and stable control of EUV-induced hydrogen plasma".Journal of Applied Physics 131.23(2022):9.

入库方式: OAI收割

来源:长春光学精密机械与物理研究所

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