Negative irradiance-dependent nonlinear refraction in single-layer graphene
文献类型：会议论文
| 作者 | Demetriou, G.2; Biancalana, F.2; Abraham, E.3; Ji, W.1; Wang, Y.4; Kar, A.K.2 |
| 出版日期 | 1905-07-10 |
| 会议日期 | May 13, 2018 - May 18, 2018 |
| 会议地点 | San Jose, CA, United states |
| 关键词 | Refraction |
| 卷号 | Part F92-CLEO_AT 2018 |
| DOI | 10.1364/CLEO_AT.2018.JTu2A.115 |
| 英文摘要 | We show that single-layer graphene presents negative irradiance-dependent nonlinear refraction. We discriminate between a low-irradiance regime, where the conventional Kerr effect applies and a high-irradiance regime where the nonlinear refraction becomes irradiance-dependent. 漏 OSA 2018. |
| 资助机构 | OSA - The Optical Society |
| 会议录 | CLEO: Applications and Technology, CLEO_AT 2018
 |
| 学科主题 | Graphene |
| 源URL | [http://ir.ipe.ac.cn/handle/122111/59342]  |
| 作者单位 | 1.Department of Physics, National University of Singapore, 2 Science Drive 3, 117542, Singapore 2.Institute of Photonics and Quantum Sciences, School of Engineering and Physical Sciences, David Brewster Building, Heriot-Watt University, Edinburgh; EH14 4AS, United Kingdom 3.Institute of Biological Chemistry, Biophysics and Bioengineering, School of Engineering and Physical Sciences, David Brewster Building, Heriot-Watt University, Edinburgh; EH14 4AS, United Kingdom 4.State Key Laboratory of Multiphase Complex Systems, Institute of Process Engineering, Chinese Academy of Sciences, Beijing; 100190, China |
| 推荐引用方式 GB/T 7714 | Demetriou, G.,Biancalana, F.,Abraham, E.,et al. Negative irradiance-dependent nonlinear refraction in single-layer graphene[C]. 见:. San Jose, CA, United states. May 13, 2018 - May 18, 2018. |
入库方式： OAI收割
来源：过程工程研究所
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