中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Impact of Device Topology on the Performance of High-Speed 1550 nm Wafer-Fused VCSELs

文献类型:期刊论文

作者A. Babichev, S. Blokhin, A. Gladyshev, L. Karachinsky, I. Novikov, A. Blokhin, M. Bobrov, Y. Kovach, A. Kuzmenkov, V. Nevedomsky, N. Maleev, E. Kolodeznyi, K. Voropaev, A. Vasilyev, V. Ustinov, A. Egorov, S. Y. Han, S. C. Tian and D. Bimberg
刊名Photonics
出版日期2023
卷号10期号:6页码:15
DOI10.3390/photonics10060660
英文摘要A detailed experimental analysis of the impact of device topology on the performance of 1550 nm VCSELs with an active region based on thin InGaAs/InAlGaAs quantum wells and a composite InAlGaAs buried tunnel junction is presented. The high-speed performance of the lasers with L-type device topology (with the largest double-mesa sizes) is mainly limited by electrical parasitics showing noticeable damping of the relaxation oscillations. For the S-type device topology (with the smallest double-mesa sizes), the decrease in the parasitic capacitance of the reverse-biased p(+)n-junction region outside the buried tunnel junction region allowed to raise the parasitic cutoff frequency up to 13-14 GHz. The key mechanism limiting the high-speed performance of such devices is thus the damping of the relaxation oscillations. VCSELs with S-type device topology demonstrate more than 13 GHz modulation bandwidth and up to 37 Gbps nonreturn-to-zero data transmission under back-to-back conditions at 20 & DEG;C.
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语种英语
源URL[http://ir.ciomp.ac.cn/handle/181722/67330]  
专题中国科学院长春光学精密机械与物理研究所
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A. Babichev, S. Blokhin, A. Gladyshev, L. Karachinsky, I. Novikov, A. Blokhin, M. Bobrov, Y. Kovach, A. Kuzmenkov, V. Nevedomsky, N. Maleev, E. Kolodeznyi, K. Voropaev, A. Vasilyev, V. Ustinov, A. Egorov, S. Y. Han, S. C. Tian and D. Bimberg. Impact of Device Topology on the Performance of High-Speed 1550 nm Wafer-Fused VCSELs[J]. Photonics,2023,10(6):15.
APA A. Babichev, S. Blokhin, A. Gladyshev, L. Karachinsky, I. Novikov, A. Blokhin, M. Bobrov, Y. Kovach, A. Kuzmenkov, V. Nevedomsky, N. Maleev, E. Kolodeznyi, K. Voropaev, A. Vasilyev, V. Ustinov, A. Egorov, S. Y. Han, S. C. Tian and D. Bimberg.(2023).Impact of Device Topology on the Performance of High-Speed 1550 nm Wafer-Fused VCSELs.Photonics,10(6),15.
MLA A. Babichev, S. Blokhin, A. Gladyshev, L. Karachinsky, I. Novikov, A. Blokhin, M. Bobrov, Y. Kovach, A. Kuzmenkov, V. Nevedomsky, N. Maleev, E. Kolodeznyi, K. Voropaev, A. Vasilyev, V. Ustinov, A. Egorov, S. Y. Han, S. C. Tian and D. Bimberg."Impact of Device Topology on the Performance of High-Speed 1550 nm Wafer-Fused VCSELs".Photonics 10.6(2023):15.

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来源:长春光学精密机械与物理研究所

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