Accurate measurement and adjustment method for interference fringe direction in a scanning beam interference lithography system
文献类型：期刊论文
| 作者 | Y. Li; S. Jiang; X. Chen; Z. Liu; W. Wang; Y. Song and Bayanheshig |
| 刊名 | Optics Express
 |
| 出版日期 | 2023 |
| 卷号 | 31期号:17页码:28145-28160 |
| ISSN号 | 10944087 |
| DOI | 10.1364/OE.485488 |
| 英文摘要 | To improve the exposure contrast of the scanning beam interference lithography (SBIL) system, a mathematical model of scanning exposure that includes the direction error of the measurement mirror is established. The effect of the angle between the interference fringe direction and the X-axis measurement mirror direction on the exposure contrast is analyzed. An accurate method for interference fringe direction measurement based on the heterodyne interferometry measurement method of the metrology grating and phase shift interferometry is proposed. This method combines the diffraction characteristics of the metrology grating and the phase shift algorithm to calculate the angle between the interference fringe direction and the measurement mirror direction accurately and adjust it. Experiments show that this angle reaches 0.6777 µrad, which meets high-precision grating fabrication requirements. Exposure comparison experiments performed at various angles show that a smaller angle between the interference fringe direction and the measurement mirror direction leads to better grating groove production by scanning exposure, which is consistent with the theoretical analysis. The accuracy of the theoretical analysis and the feasibility of the interference fringe direction adjustment method are verified, laying a foundation for high-quality grating fabrication by the SBIL system. © 2023 Optica Publishing Group under the terms of the Optica Open Access Publishing Agreement. |
| URL标识 | 查看原文 |
| 源URL | [http://ir.ciomp.ac.cn/handle/181722/67653]  |
| 专题 | 中国科学院长春光学精密机械与物理研究所 |
| 推荐引用方式 GB/T 7714 | Y. Li,S. Jiang,X. Chen,et al. Accurate measurement and adjustment method for interference fringe direction in a scanning beam interference lithography system[J]. Optics Express,2023,31(17):28145-28160. |
| APA | Y. Li,S. Jiang,X. Chen,Z. Liu,W. Wang,&Y. Song and Bayanheshig.(2023).Accurate measurement and adjustment method for interference fringe direction in a scanning beam interference lithography system.Optics Express,31(17),28145-28160. |
| MLA | Y. Li,et al."Accurate measurement and adjustment method for interference fringe direction in a scanning beam interference lithography system".Optics Express 31.17(2023):28145-28160. |
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