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Selective Exposure of Robust Perovskite Layer of Aurivillius-Type Compounds for Stable Photocatalytic Overall Water Splitting

文献类型：期刊论文

作者Huang, Jie3,5; Kang, Yuyang3; Liu, Jian-An3,5; Chen, Ruotian4; Xie, Tengfeng6; Liu, Zhongran7; Xu, Xiaoxiang8; Tian, He7; Yin, Lichang3,5; Fan, Fengtao4
刊名ADVANCED SCIENCE
出版日期2023-05-31
页码9
关键词Aurivillius compounds overall water splitting perovskites photocatalysis surface termination
DOI10.1002/advs.202302206
通讯作者Liu, Gang(gangliu@imr.ac.cn)
英文摘要Aurivillius-type compounds ((Bi2O2)(2+)(A(n)(-1)B(n)O(3)(n)(+1))(2-)) with alternately stacked layers of bismuth oxide (Bi2O2)(2+) and perovskite (A(n)(-1)B(n)O(3)(n)(+1))(2-) are promising photocatalysts for overall water splitting due to their suitable band structures and adjustable layered characteristics. However, the self-reduction of Bi3+ at the top (Bi2O2)(2+) layers induced by photogenerated electrons during photocatalytic processes causes inactivation of the compounds as photocatalysts. Here, using Bi3TiNbO9 as a model photocatalyst, its surface termination is modulated by acid etching, which well suppresses the self-corrosion phenomenon. A combination of comprehensive experimental investigations together with theoretical calculations reveals the transition of the material surface from the self-reduction-sensitive (Bi2O2)(2+) layer to the robust (BiTiNbO7)(2-) perovskite layer, enabling effective electron transfer through surface trapping and effective hole transfer through surface electric field, and also efficient transfer of the electrons to the cocatalyst for greatly enhanced photocatalytic overall water splitting. Moreover, this facile modification strategy can be readily extended to other Aurivillius compounds (e.g., SrBi2Nb2O9, Bi4Ti3O12, and SrBi4Ti4O15) and therefore justify its usefulness in rationally tailoring surface structures of layered photocatalysts for high photocatalytic overall water-splitting activity and stability.
资助项目National Key R&D Program of China[2021YFA1500800] ; National Natural Science Foundation of China[51825204] ; National Natural Science Foundation of China[52120105003] ; National Natural Science Foundation of China[51972312] ; CAS Projects for Young Scientists in Basic Research[YSBR-004]
WOS研究方向Chemistry ; Science & Technology - Other Topics ; Materials Science
语种英语
WOS记录号WOS:000998326200001
出版者WILEY
资助机构National Key R&D Program of China ; National Natural Science Foundation of China ; CAS Projects for Young Scientists in Basic Research
源URL[http://ir.imr.ac.cn/handle/321006/178006]  
专题金属研究所_中国科学院金属研究所
通讯作者Liu, Gang
作者单位1.Univ Queensland, Nanomat Ctr, Sch Chem Engn, St Lucia, Qld 4072, Australia
2.Univ Queensland, Australian Inst Bioengn & Nanotechnol, St Lucia, Qld 4072, Australia
3.Chinese Acad Sci, Inst Met Res, Shenyang Natl Lab Mat Sci, 72 Wenhua Rd, Shenyang 110016, Peoples R China
4.Chinese Acad Sci, Dalian Inst Chem Phys, State Key Lab Catalysis, Dalian Natl Lab Clean Energy,iChEM, Dalian 116023, Peoples R China
5.Univ Sci & Technol China, Sch Mat Sci & Engn, 72 Wenhua Rd, Shenyang 110016, Peoples R China
6.Jilin Univ, Coll Chem, Changchun 130012, Peoples R China
7.Zhejiang Univ, Ctr Electron Microscopy, Sch Mat Sci & Engn, Hangzhou 310027, Peoples R China
8.Tongji Univ, Sch Chem Sci & Engn, Shanghai 200092, Peoples R China
推荐引用方式
GB/T 7714		 Huang, Jie,Kang, Yuyang,Liu, Jian-An,et al. Selective Exposure of Robust Perovskite Layer of Aurivillius-Type Compounds for Stable Photocatalytic Overall Water Splitting[J]. ADVANCED SCIENCE,2023:9.
APA Huang, Jie.,Kang, Yuyang.,Liu, Jian-An.,Chen, Ruotian.,Xie, Tengfeng.,...&Liu, Gang.(2023).Selective Exposure of Robust Perovskite Layer of Aurivillius-Type Compounds for Stable Photocatalytic Overall Water Splitting.ADVANCED SCIENCE,9.
MLA Huang, Jie,et al."Selective Exposure of Robust Perovskite Layer of Aurivillius-Type Compounds for Stable Photocatalytic Overall Water Splitting".ADVANCED SCIENCE (2023):9.

入库方式： OAI收割

来源：金属研究所

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