Effect of Cu/Ga interfacial reaction on heat transfer performance
文献类型:期刊论文
作者 | Du, Xinyu1,4; Wang, Wendong1,2; Ding, Zifeng4; Wang, Xiaojing4; Qiao, Yanxin4; Wei, Song3; Zhu, Qingsheng1,2; Guo, Jingdong1,2 |
刊名 | JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS
![]() |
出版日期 | 2023-06-01 |
卷号 | 34期号:17页码:10 |
ISSN号 | 0957-4522 |
DOI | 10.1007/s10854-023-10782-3 |
通讯作者 | Guo, Jingdong(jdguo@imr.ac.cn) |
英文摘要 | The interfacial reactions between Ga and Cu were studied under isothermal conditions at 70, 110, and 150 degrees C. The SEM morphology and XRD analysis revealed that only CuGa2 phases were formed at these temperatures. The growth of CuGa2 is described by the parabolic law, indicating that the body diffusion mechanism plays a dominant role in its growth. The activation energy of CuGa2 change was calculated as 14.25 kJ/mol. The effect of the intermetallic compounds (IMCs) growth on the heat transfer performance of gallium-based thermal interface materials (Ga-based TIMs) has been investigated. Thermal resistance test results show that the thermal resistance value rapidly decreases during the aging from 0 to 6 h and increases slowly in the subsequent aging process. These findings suggest that the thermal transfer performance of Ga-based TIM will not be significantly impacted by the formation and growth of CuGa2 at the interface. |
资助项目 | National Natural Science Foundation of China[51971231] ; Guangxi Natural Science Foundation[2020GXNSFBA297109] ; Guangxi Science and Technology Program[GuikeAD20297023] ; Science and Technology Plan Project of Yunnan province[202101BC070001-007] |
WOS研究方向 | Engineering ; Materials Science ; Physics |
语种 | 英语 |
WOS记录号 | WOS:001007922800003 |
出版者 | SPRINGER |
资助机构 | National Natural Science Foundation of China ; Guangxi Natural Science Foundation ; Guangxi Science and Technology Program ; Science and Technology Plan Project of Yunnan province |
源URL | [http://ir.imr.ac.cn/handle/321006/178225] ![]() |
专题 | 金属研究所_中国科学院金属研究所 |
通讯作者 | Guo, Jingdong |
作者单位 | 1.Chinese Acad Sci, Inst Met Res, Shenyang Natl Lab Mat Sci, Shenyang 110016, Peoples R China 2.Univ Sci & Technol China, Sch Mat Sci & Engn, Shenyang 110016, Peoples R China 3.Guilin Univ Elect Technol, Sch Mech & Elect Engn, Guangxi Key Lab Mfg Syst & Adv Mfg Technol, Guilin 541004, Peoples R China 4.Jiangsu Univ Sci & Technol, Coll Mat Sci & Engn, Zhenjiang 212001, Peoples R China |
推荐引用方式 GB/T 7714 | Du, Xinyu,Wang, Wendong,Ding, Zifeng,et al. Effect of Cu/Ga interfacial reaction on heat transfer performance[J]. JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS,2023,34(17):10. |
APA | Du, Xinyu.,Wang, Wendong.,Ding, Zifeng.,Wang, Xiaojing.,Qiao, Yanxin.,...&Guo, Jingdong.(2023).Effect of Cu/Ga interfacial reaction on heat transfer performance.JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS,34(17),10. |
MLA | Du, Xinyu,et al."Effect of Cu/Ga interfacial reaction on heat transfer performance".JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS 34.17(2023):10. |
入库方式: OAI收割
来源:金属研究所
浏览0
下载0
收藏0
其他版本
除非特别说明,本系统中所有内容都受版权保护,并保留所有权利。