中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Nanopatterning of silicon via the near-field enhancement effect upon double-pulse femtosecond laser exposure

文献类型:期刊论文

作者Hong, Quan; Zhang, Jin; Wang, Sumei; Chu, Zhuyuan; Wang, Mengmeng; Sun, Jiaxin; Guo, Qitong
刊名Applied Optics
出版日期2021
卷号60期号:25页码:7790-7797
目次
语种英语
版本出版稿
源URL[http://ir.idsse.ac.cn/handle/183446/11616]  
专题深海工程技术部_深海资源开发研究室
作者单位Laser Micro/Nano Fabrication Laboratory, School of Mechanical Engineering, Beijing Institute of Technology
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GB/T 7714
Hong, Quan,Zhang, Jin,Wang, Sumei,et al. Nanopatterning of silicon via the near-field enhancement effect upon double-pulse femtosecond laser exposure[J]. Applied Optics,2021,60(25):7790-7797.
APA Hong, Quan.,Zhang, Jin.,Wang, Sumei.,Chu, Zhuyuan.,Wang, Mengmeng.,...&Guo, Qitong.(2021).Nanopatterning of silicon via the near-field enhancement effect upon double-pulse femtosecond laser exposure.Applied Optics,60(25),7790-7797.
MLA Hong, Quan,et al."Nanopatterning of silicon via the near-field enhancement effect upon double-pulse femtosecond laser exposure".Applied Optics 60.25(2021):7790-7797.

入库方式: OAI收割

来源:深海科学与工程研究所

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