Photocatalytic assisted chemical mechanical polishing for silicon carbide using developed ceria coated diamond core-shell abrasives
文献类型：期刊论文
| 作者 | Zhu, Xiaoxiao1,2; Gui, Yuziyu1,2; Fu, Hao1,2; Ding, Juxuan1,2; Mo, Zhangchao1,2; Jiang, Xuesong3; Sun, Jifei3; Ban, Boyuan2 ; Wang, Ling2; Chen, Jian2,3
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| 刊名 | TRIBOLOGY INTERNATIONAL
 |
| 出版日期 | 2024-09-01 |
| 卷号 | 197 |
| 关键词 | Silicon carbide (SiC) Photocatalytic-assisted chemical mechanical polishing (PCMP) Core/shell abrasives Materials removal mechanism |
| ISSN号 | 0301-679X |
| DOI | 10.1016/j.triboint.2024.109827 |
| 通讯作者 | Chen, Jian(jchen@ipp.ac.cn) |
| 英文摘要 | The practical application of current photocatalytic-assisted chemical mechanical polishing (PCMP) technology still faces some challenges and difficulties, such as complex preparation process of abrasives, chemical failure, and the use of toxic chemicals. Herein, novel CeO 2 -coated diamond core/shell structure abrasives were successfully synthesized using a chemical precipitation method and applied in SiC-PCMP. After coating CeO 2 on the surface of the diamond, the materials removal rate (MRR) was 56 % higher than that of the diamond abrasives. With ultraviolet (UV) irradiation, the MRR of CeO 2 /diamond abrasives (11.5 nm/min) increased by about 195 % compared with CeO 2 /diamond composite abrasives without UV. High surface quality (Ra: 0.4 nm) of the SiC substrate was obtained under UV light irradiation. The materials removal mechanism of SiC-PCMP was proposed. |
| WOS关键词 | HIGH-EFFICIENCY ; PLANARIZATION CMP ; WAFER ; NANOPARTICLES ; COMPOSITE ; NANODIAMONDS ; PARTICLES ; CARBON |
| 资助项目 | National Natural Science Foundation of China[51874272] ; National Natural Science Foundation of China[51804294] ; National Natural Science Foundation of China[52111540265] ; Anhui Provincial Natural Science Foundation[1808085ME121] ; Key Laboratory of Photovoltaic and Energy Conservation Materials, Chinese Academy of Science[PECL2021QN003] ; HFIPS President Foundation[YZJJZX202018] ; International Clean Energy Talent Program by China Scholarship Council |
| WOS研究方向 | Engineering |
| 语种 | 英语 |
| WOS记录号 | WOS:001246329900001 |
| 出版者 | ELSEVIER SCI LTD |
| 资助机构 | National Natural Science Foundation of China ; Anhui Provincial Natural Science Foundation ; Key Laboratory of Photovoltaic and Energy Conservation Materials, Chinese Academy of Science ; HFIPS President Foundation ; International Clean Energy Talent Program by China Scholarship Council |
| 源URL | [http://ir.hfcas.ac.cn:8080/handle/334002/136517]  |
| 专题 | 中国科学院合肥物质科学研究院 |
| 通讯作者 | Chen, Jian |
| 作者单位 | 1.Univ Sci & Technol China, Hefei 230026, Peoples R China 2.Chinese Acad Sci, Inst Solid State Phys, Key Lab Photovolta & Energy Conservat Mat, HFIPS, Hefei 230031, Peoples R China 3.Hefei Comprehens Natl Sci Ctr, Inst Energy, Hefei 230031, Peoples R China |
| 推荐引用方式 GB/T 7714 | Zhu, Xiaoxiao,Gui, Yuziyu,Fu, Hao,et al. Photocatalytic assisted chemical mechanical polishing for silicon carbide using developed ceria coated diamond core-shell abrasives[J]. TRIBOLOGY INTERNATIONAL,2024,197. |
| APA | Zhu, Xiaoxiao.,Gui, Yuziyu.,Fu, Hao.,Ding, Juxuan.,Mo, Zhangchao.,...&Chen, Jian.(2024).Photocatalytic assisted chemical mechanical polishing for silicon carbide using developed ceria coated diamond core-shell abrasives.TRIBOLOGY INTERNATIONAL,197. |
| MLA | Zhu, Xiaoxiao,et al."Photocatalytic assisted chemical mechanical polishing for silicon carbide using developed ceria coated diamond core-shell abrasives".TRIBOLOGY INTERNATIONAL 197(2024). |
入库方式： OAI收割
来源：合肥物质科学研究院
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