Effect of N2/CH4 flow ratio on microstructure and composition of hydrogenated carbon nitride films prepared by a dual DC-RF plasma system
文献类型：期刊论文
| 作者 | Hao JY(郝俊英) ; Xue QJ(薛群基); Liu WM(刘维民)
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| 刊名 | Journal of Non-Crystalline Solids
 |
| 出版日期 | 2007 |
| 卷号 | 353页码:136-142 |
| 关键词 | Films and coatings Chemical vapor deposition Plasma deposition Vapor phase deposition Hardness Indentation Microindentation Microstructure FTIR measurements XPS |
| ISSN号 | 0022-3093 |
| 通讯作者 | 郝俊英 |
| 中文摘要 | Hydrogenated carbon nitride (a-CN:H) films were deposited on n-type (100) silicon substrates making use of direct current radio frequency plasma enhanced chemical vapor deposition (DC-RF-PECVD), using a gas mixture of CH4 and N2 as the source gas in range of N2/CH4 flow ratio from 1/3 to 3/1 (sccm). The deposition rate, composition and bonding structure of the a-CN:H films were characterized by means of X-ray photoelectron spectroscopy (XPS) and Fourier-transform infrared spectrometry (FTIR). The mechanical properties of the deposited films were evaluated using nano-indentation test. It was found that the parameter for the DC-RF-PECVD process had significant effects on the growth rate, structure and properties of the deposited films. The deposition rate of the films decreased clearly, while the N/C ratio in the films increased with increasing N2/CH4 flow ratio. CN radicals were remarkably formed in the deposited films at different N2/CH4 flow ratio, and their contents are related to the nitrogen concentrations in the deposited films. Moreover, the hardness and Young’s modulus of the a-CN:H films sharply increased at first with increasing N2/CH4 flow ratio, then dramatically decreased with further increase of the N2/CH4 flow ratio, and the a-CN:H film deposited at 1/1 had the maximum hardness and Young’s modulus. In addition, the structural transformation from sp3-like to sp2-like carbon–nitrogen network in the deposited films also was revealed. |
| 学科主题 | 材料科学与物理化学 |
| 收录类别 | SCI |
| 资助信息 | the National Natural Science Foundation of China (Grant Nos. 50405040;50432020);‘973’ program of China (Grant No. 2007CB607601);the Innovative Group Foundation from NSFC (Grant No. 50421502) |
| 语种 | 英语 |
| 公开日期 | 2013-11-01 |
| 源URL | [http://210.77.64.217/handle/362003/4046]  |
| 专题 | 兰州化学物理研究所_固体润滑国家重点实验室 |
| 通讯作者 | Hao JY(郝俊英) |
| 推荐引用方式 GB/T 7714 | Hao JY,Xue QJ,Liu WM. Effect of N2/CH4 flow ratio on microstructure and composition of hydrogenated carbon nitride films prepared by a dual DC-RF plasma system[J]. Journal of Non-Crystalline Solids,2007,353:136-142. |
| APA | 郝俊英,薛群基,&刘维民.(2007).Effect of N2/CH4 flow ratio on microstructure and composition of hydrogenated carbon nitride films prepared by a dual DC-RF plasma system.Journal of Non-Crystalline Solids,353,136-142. |
| MLA | 郝俊英,et al."Effect of N2/CH4 flow ratio on microstructure and composition of hydrogenated carbon nitride films prepared by a dual DC-RF plasma system".Journal of Non-Crystalline Solids 353(2007):136-142. |
入库方式： OAI收割
来源：兰州化学物理研究所
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