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Atomistic studies of helium trapping and diffusion at Ni-graphene interfaces

文献类型：期刊论文

作者Huang, Hai3; Ge, Xiaoxin3; Yu, Xu2,3; Jiang, Yanxin3; Peng Q(彭庆)1
刊名EUROPEAN PHYSICAL JOURNAL PLUS
出版日期2025-06-06
卷号140期号:6页码:7
ISSN号2190-5444
DOI10.1140/epjp/s13360-025-06447-1
通讯作者Huang, Hai(huanghai@zzu.edu.cn)
英文摘要The use of metal-nanocarbon interfaces to prevent the bubble-to-void transition has emerged as a novel approach for developing materials resistant to helium (He) embrittlement. However, many critical mechanisms governing He dynamics near these interfaces remain inadequately understood. Here we employed the Ni-graphene interface (NGI) as a model system to investigate He trapping and diffusion through atomistic simulations (300-1,200 K). Key findings demonstrate rapid He trapping at NGIs, with anisotropic in-plane diffusion (110\documentclass[12pt]{minimal} \usepackage{amsmath} \usepackage{wasysym} \usepackage{amsfonts} \usepackage{amssymb} \usepackage{amsbsy} \usepackage{mathrsfs} \usepackage{upgreek} \setlength{\oddsidemargin}{-69pt} \begin{document}$$ \left[ {\bar{1}10} \right] $$\end{document}, 112\documentclass[12pt]{minimal} \usepackage{amsmath} \usepackage{wasysym} \usepackage{amsfonts} \usepackage{amssymb} \usepackage{amsbsy} \usepackage{mathrsfs} \usepackage{upgreek} \setlength{\oddsidemargin}{-69pt} \begin{document}$$ \left[ {\bar{1}\bar{1}2} \right] $$\end{document}) exhibiting a tenfold higher diffusivity (prefactor: 6.251 x 10-2 nm2 & sdot;ps-1) and lower activation energy (0.057 eV) than pure Ni. Above 600 K, interfacial capture dominates, minimizing bulk residence. Unlike hydrogen, which forms stable C-H bonds, He migrates freely along NGIs without chemical interaction, promoting release. NGIs could suppress 3D bubble growth by redirecting He into planar pathways, aligning with observed bubble size reduction. The work contrasts He dynamics at NGIs versus grain boundaries, highlighting the superior capacity of metal-nanocarbon interfaces for He venting. These insights provide a mechanistic basis for designing helium-resistant composites, advancing strategies to mitigate embrittlement through controlled helium transport.
分类号二类
WOS关键词GRAIN-BOUNDARIES ; MIGRATION ; DYNAMICS ; BUBBLES ; ATOMS
资助项目National Natural Science Foundation of China[12105249] ; National Natural Science Foundation of China[2025HYTP047] ; Young Talent Support Program of Henan Association for Science and Technology[242102230052] ; Key Project for Science and Technology Development of Henan Province[202102012] ; Henan Province Postdoctoral Science Foundation ; National Supercomputing Center in Zhengzhou
WOS研究方向Physics
语种英语
WOS记录号WOS:001503359500002
资助机构National Natural Science Foundation of China ; National Natural Science Foundation of China ; Young Talent Support Program of Henan Association for Science and Technology ; Key Project for Science and Technology Development of Henan Province ; Henan Province Postdoctoral Science Foundation ; National Supercomputing Center in Zhengzhou
其他责任者Huang, Hai
源URL[http://dspace.imech.ac.cn/handle/311007/101796]  
专题力学研究所_非线性力学国家重点实验室
作者单位1.Chinese Acad Sci, Inst Mech, State Key Lab Nonlinear Mech, Beijing 100190, Peoples R China
2.Zhengzhou Univ, Sch Phys, Int Joint Lab Integrated Circuits Design & Applica, Minist Educ, Zhengzhou 450001, Peoples R China;
3.Zhengzhou Univ, Sch Phys, Key Lab Mat Phys, Minist Educ, Zhengzhou 450001, Peoples R China;
推荐引用方式
GB/T 7714		 Huang, Hai,Ge, Xiaoxin,Yu, Xu,et al. Atomistic studies of helium trapping and diffusion at Ni-graphene interfaces[J]. EUROPEAN PHYSICAL JOURNAL PLUS,2025,140(6):7.
APA Huang, Hai,Ge, Xiaoxin,Yu, Xu,Jiang, Yanxin,&彭庆.(2025).Atomistic studies of helium trapping and diffusion at Ni-graphene interfaces.EUROPEAN PHYSICAL JOURNAL PLUS,140(6),7.
MLA Huang, Hai,et al."Atomistic studies of helium trapping and diffusion at Ni-graphene interfaces".EUROPEAN PHYSICAL JOURNAL PLUS 140.6(2025):7.

入库方式： OAI收割

来源：力学研究所

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