Implantation profiles and depth distribution of slow positron beam simulated by Geant4 toolkit
文献类型：期刊论文
| 作者 | Li, C; Cao, XZ; Ning, X; Liu, FY; Wang, BY; Zhang, P; Wei, L; Li, DM |
| 刊名 | PHYSICA SCRIPTA
 |
| 出版日期 | 2019 |
| 卷号 | 94期号:4 |
| 关键词 | Geant4 positron implantation profile backscatter slow positron beam |
| ISSN号 | 0031-8949 |
| DOI | 10.1088/1402-4896/aafaa2 |
| 文献子类 | 期刊 |
| 英文摘要 | The positron implantation profiles and depth distribution in metal, semiconductor, and polymer surfaces are simulated using the Monte-Carlo-method-based Geant4 toolkit. As per the slow positron beam technique, the monoenergetic positron beams (in the range from 1 to 35 keV) with 1.5 mm radius is injected into semi-infinite samples in the present work. The implantation profile of 3.1 keV positrons in Fe is in good agreement with the Makhovian profile. The mean depth and depth resolution exhibit a general negative correlation with the material densities and incident position energy, respectively, while the fixed peak energy of backscattered positrons exhibits a net correlation with atomic number Z. Furthermore, the implantation profiles present better z-axis resolution with increasing incident angle, and this effect is more prominent for low-density materials. The results can provide theoretical support for new measurement methods based on the slow positron beam technique, such as segment measurements and micro-beam scanning measurements. |
| 电子版国际标准刊号 | 1402-4896 |
| WOS关键词 | ANNIHILATION ; ELECTRON |
| WOS研究方向 | Physics |
| 语种 | 英语 |
| WOS记录号 | WOS:000457186100001 |
| 源URL | [https://ir.ihep.ac.cn/handle/311005/304195]  |
| 专题 | 高能物理研究所_多学科研究中心 |
| 作者单位 | 中国科学院高能物理研究所 |
| 推荐引用方式 GB/T 7714 | Li, C,Cao, XZ,Ning, X,et al. Implantation profiles and depth distribution of slow positron beam simulated by Geant4 toolkit[J]. PHYSICA SCRIPTA,2019,94(4). |
| APA | Li, C.,Cao, XZ.,Ning, X.,Liu, FY.,Wang, BY.,...&Li, DM.(2019).Implantation profiles and depth distribution of slow positron beam simulated by Geant4 toolkit.PHYSICA SCRIPTA,94(4). |
| MLA | Li, C,et al."Implantation profiles and depth distribution of slow positron beam simulated by Geant4 toolkit".PHYSICA SCRIPTA 94.4(2019). |
入库方式： OAI收割
来源：高能物理研究所
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