Implantation profiles of muon and secondary positron simulated by Geant4
文献类型:期刊论文
| 作者 | Li, C; Cao, XZ; Kuang, P; Liu, FY; Chen, YK; Li, Y; Wei, L |
| 刊名 | PHYSICA SCRIPTA
![]() |
| 出版日期 | 2021 |
| 卷号 | 96期号:12页码:125305 |
| 关键词 | Geant4 muon beam secondary positrons implantation profile transmission imaging |
| ISSN号 | 0031-8949 |
| DOI | 10.1088/1402-4896/ac1dc8 |
| 文献子类 | 期刊 |
| 英文摘要 | The distribution of muon beams and secondary positrons can be vital reference data for the application of the accelerator muon transmission imaging technique. In this study, the distribution of muon beams and secondary positrons in biological tissue, semiconductors, and metals was simulated using Geant4. The muon beam showed an extremely concentrated decay area, which presented quite high depth resolution (FWHM ranging from 1.68 cm to 11.83 cm) and great penetrability (mean depth ranging from 18.03 cm to 198.97 cm) in media. Based on the simulation data, an empirical equation was designed for the quick calculation of muon beams with different energies in various materials. Additionally, the secondary positrons distribution of a 200 MeV muon beam centered on its decay position and covered an 8.50 cm radius area in Fe. The number of positrons was much higher than that of primary muons, especially in high-density materials. As a consequence of these two aspects, the combined signal processing of muons and secondary positrons provides the potential to improve muon imaging. |
| 电子版国际标准刊号 | 1402-4896 |
| WOS关键词 | FACILITIES ; PROPOSAL |
| WOS研究方向 | Physics |
| 语种 | 英语 |
| WOS记录号 | WOS:000688235700001 |
| 源URL | [https://ir.ihep.ac.cn/handle/311005/304402] ![]() |
| 专题 | 高能物理研究所_多学科研究中心 |
| 作者单位 | 中国科学院高能物理研究所 |
| 推荐引用方式 GB/T 7714 | Li, C,Cao, XZ,Kuang, P,et al. Implantation profiles of muon and secondary positron simulated by Geant4[J]. PHYSICA SCRIPTA,2021,96(12):125305. |
| APA | Li, C.,Cao, XZ.,Kuang, P.,Liu, FY.,Chen, YK.,...&Wei, L.(2021).Implantation profiles of muon and secondary positron simulated by Geant4.PHYSICA SCRIPTA,96(12),125305. |
| MLA | Li, C,et al."Implantation profiles of muon and secondary positron simulated by Geant4".PHYSICA SCRIPTA 96.12(2021):125305. |
入库方式: OAI收割
来源:高能物理研究所
浏览0
下载0
收藏0
其他版本
除非特别说明,本系统中所有内容都受版权保护,并保留所有权利。

