Evaluating an electric field modulated plasma enhanced atomic layer deposition of platinum layers on different substrates
文献类型：期刊论文
| 作者 | Yan, MM; Zhang, TC; Wang, B; Liu, J; Liang, XX; Xu, YZ; Yi, FT |
| 刊名 | JOURNAL OF APPLIED PHYSICS
 |
| 出版日期 | 2023 |
| 卷号 | 134期号:15页码:155303 |
| ISSN号 | 0021-8979 |
| DOI | 10.1063/5.0157164 |
| 文献子类 | Article |
| 电子版国际标准刊号 | 1089-7550 |
| WOS记录号 | WOS:001086914700008 |
| 源URL | [https://ir.ihep.ac.cn/handle/311005/305046]  |
| 专题 | 高能物理研究所_多学科研究中心 |
| 推荐引用方式 GB/T 7714 | Yan, MM,Zhang, TC,Wang, B,et al. Evaluating an electric field modulated plasma enhanced atomic layer deposition of platinum layers on different substrates[J]. JOURNAL OF APPLIED PHYSICS,2023,134(15):155303. |
| APA | Yan, MM.,Zhang, TC.,Wang, B.,Liu, J.,Liang, XX.,...&Yi, FT.(2023).Evaluating an electric field modulated plasma enhanced atomic layer deposition of platinum layers on different substrates.JOURNAL OF APPLIED PHYSICS,134(15),155303. |
| MLA | Yan, MM,et al."Evaluating an electric field modulated plasma enhanced atomic layer deposition of platinum layers on different substrates".JOURNAL OF APPLIED PHYSICS 134.15(2023):155303. |
入库方式： OAI收割
来源：高能物理研究所
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