Optimizing the slicing pattern of stress-relief crystal analyzers for X-ray Raman scattering
文献类型：期刊论文
| 作者 | Diao, QS; Zhang, YJ; Jin, SX; He, SM; Zeng, JR; Bian, FG; Yang, JL; Hong, Z; Lian, HK; Gan, XL |
| 刊名 | JOURNAL OF APPLIED CRYSTALLOGRAPHY
 |
| 出版日期 | 2023 |
| 卷号 | 56页码:1505-1511 |
| ISSN号 | 1600-5767 |
| DOI | 10.1107/S1600576723007781 |
| 文献子类 | Article |
| WOS记录号 | WOS:001085065300020 |
| 源URL | [https://ir.ihep.ac.cn/handle/311005/305116]  |
| 专题 | 高能物理研究所_多学科研究中心 |
| 推荐引用方式 GB/T 7714 | Diao, QS,Zhang, YJ,Jin, SX,et al. Optimizing the slicing pattern of stress-relief crystal analyzers for X-ray Raman scattering[J]. JOURNAL OF APPLIED CRYSTALLOGRAPHY,2023,56:1505-1511. |
| APA | Diao, QS.,Zhang, YJ.,Jin, SX.,He, SM.,Zeng, JR.,...&Xu, W.(2023).Optimizing the slicing pattern of stress-relief crystal analyzers for X-ray Raman scattering.JOURNAL OF APPLIED CRYSTALLOGRAPHY,56,1505-1511. |
| MLA | Diao, QS,et al."Optimizing the slicing pattern of stress-relief crystal analyzers for X-ray Raman scattering".JOURNAL OF APPLIED CRYSTALLOGRAPHY 56(2023):1505-1511. |
入库方式： OAI收割
来源：高能物理研究所
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