中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Photoelectric characteristic of single-phase InxGa1-xN films with tunable bandgap through RF magnetron sputtering (vol 59, pg 21828, 2024)

文献类型:期刊论文

作者Li, Ziyuan1; Shen, Longhai1; Zhou, Ouxiang1; Zhu, Xiaotian2; Zhang, Yu1; Wang, Quhui1; Qi, Dongli1; Zhang, Xinglai1; Han, Mengyao1; Xu, Junhao1
刊名JOURNAL OF MATERIALS SCIENCE
出版日期2025
卷号60期号:4页码:2165-2167
ISSN号0022-2461
DOI10.1007/s10853-024-10575-x
通讯作者Shen, Longhai(shenlonghai@163.com)
WOS研究方向Materials Science
语种英语
WOS记录号WOS:001391137800001
出版者SPRINGER
源URL  
专题金属研究所_中国科学院金属研究所
通讯作者Shen, Longhai
作者单位1.Shenyang Ligong Univ, Sch Sci, Shenyang 110159, Peoples R China
2.Chinese Acad Sci, Inst Met Res, Shenyang Natl Lab Mat Sci, 72 Wenhua Rd, Shenyang 110016, Peoples R China
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Li, Ziyuan,Shen, Longhai,Zhou, Ouxiang,et al. Photoelectric characteristic of single-phase InxGa1-xN films with tunable bandgap through RF magnetron sputtering (vol 59, pg 21828, 2024)[J]. JOURNAL OF MATERIALS SCIENCE,2025,60(4):2165-2167.
APA Li, Ziyuan.,Shen, Longhai.,Zhou, Ouxiang.,Zhu, Xiaotian.,Zhang, Yu.,...&Li, Yuhao.(2025).Photoelectric characteristic of single-phase InxGa1-xN films with tunable bandgap through RF magnetron sputtering (vol 59, pg 21828, 2024).JOURNAL OF MATERIALS SCIENCE,60(4),2165-2167.
MLA Li, Ziyuan,et al."Photoelectric characteristic of single-phase InxGa1-xN films with tunable bandgap through RF magnetron sputtering (vol 59, pg 21828, 2024)".JOURNAL OF MATERIALS SCIENCE 60.4(2025):2165-2167.

入库方式: OAI收割

来源:金属研究所

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