A Ta 3 N 5 photoanode with few deep- level defects derived from topologic transition of ammonium tantalum oxyfluoride for ultralow- bias photoelectrochemical water splitting
文献类型:期刊论文
| 作者 | Xu, Wei1,2; Zhen, Chao1,2; Zhu, Huaze1,2; Yao, Tingting1,2; Qiu, Jianhang1,2; Liang, Yan1,2; Bai, Shuo1,3; Chen, Chunlin2; Cheng, Hui -Ming1,4; Liu, Gang1,2 |
| 刊名 | CHINESE JOURNAL OF CATALYSIS
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| 出版日期 | 2024-06-01 |
| 卷号 | 61页码:144-153 |
| 关键词 | Topologic transition Onset potential Photoelectrochemical water splitting |
| ISSN号 | 0253-9837 |
| DOI | 10.1016/S1872-2067(24)60056-2 |
| 通讯作者 | Zhen, Chao(czhen@imr.ac.cn) ; Liu, Gang(gangliu@imr.ac.cn) |
| 英文摘要 | An open challenge for developing solar-driven Ta 3 N 5-based photoanodes with the ability to induce low-bias photoelectrochemical (PEC) water splitting is that their deep-level defects originated from low-valent tantalum cations (Ta 3+ ) and nitrogen vacancies (V N ) seriously reduce the photovoltage and thus increase the bias for water splitting. Herein, we developed an effective topotactic transition synthesis route of producing few deep-level defects porous Ta 3 N 5 film from the precursor film of ammonium tantalum oxyfluoride compound ((NH 4 ) 2 Ta 2 O 3 F 6 ) pyramids on the Ta foil. The highly electronegative fluoride ions in (NH 4 ) 2 Ta 2 O 3 F 6 could weaken the Ta-O bonds and the accompanied porous structure facilitates reactant diffusion, which favors the complete nitridation. Consequently, the resulting porous Ta 3 N 5 film has very few deep-level defects, enabling an ultralow photocurrent onset potential at 0.2 V ( vs . RHE) and a short-circuit photocurrent density ( J sc ) of 3.28 mA cm -2 after decorating oxygen evolution reaction (OER) cocatalysts under AM 1.5 G irradiation. Moreover, the J sc can retain 85% of the initial value for a 5 h continuous stability test. By reducing the particle size of (NH 4 ) 2 Ta 2 O 3 F 6 pyramid precursor, the deep-level defects could be further lowered in the Ta 3 N 5 film, achieving the photoactivity for water oxidation at 0 V ( vs . RHE) after modifying the OER co-catalyst. (c) 2024, Dalian Institute of Chemical Physics, Chinese Academy of Sciences. Published by Elsevier B.V. All rights reserved. |
| 资助项目 | National Natural Science Foundation of China[52425201] ; National Natural Science Foundation of China[52072377] ; National Natural Science Foundation of China[52188101] ; National Key R&D Program of China[2021YFA1500800] ; Youth Innovation Promotion Association of the Chinese Academy of Sciences[2020192] ; CAS Projects for Young Scientists in Basic Research[YSBR-004] ; New Cornerstone Science Foundation through the XPLORER PRIZE |
| WOS研究方向 | Chemistry ; Engineering |
| 语种 | 英语 |
| WOS记录号 | WOS:001268542300001 |
| 出版者 | ELSEVIER |
| 资助机构 | National Natural Science Foundation of China ; National Key R&D Program of China ; Youth Innovation Promotion Association of the Chinese Academy of Sciences ; CAS Projects for Young Scientists in Basic Research ; New Cornerstone Science Foundation through the XPLORER PRIZE |
| 源URL | ![]() |
| 专题 | 金属研究所_中国科学院金属研究所 |
| 通讯作者 | Zhen, Chao; Liu, Gang |
| 作者单位 | 1.Chinese Acad Sci, Inst Met Res, Shenyang Natl Lab Mat Sci, Shenyang 110016, Liaoning, Peoples R China 2.Univ Sci & Technol China, Sch Mat Sci & Engn, Shenyang 110016, Liaoning, Peoples R China 3.Chinese Acad Sci, Inst Met Res, Shi Changxu Innovat Ctr Adv Mat, Shenyang 110016, Liaoning, Peoples R China 4.Chinese Acad Sci, Inst Technol Carbon Neutral, Shenzhen Inst Adv Technol, Shenzhen 518055, Guangdong, Peoples R China |
| 推荐引用方式 GB/T 7714 | Xu, Wei,Zhen, Chao,Zhu, Huaze,et al. A Ta 3 N 5 photoanode with few deep- level defects derived from topologic transition of ammonium tantalum oxyfluoride for ultralow- bias photoelectrochemical water splitting[J]. CHINESE JOURNAL OF CATALYSIS,2024,61:144-153. |
| APA | Xu, Wei.,Zhen, Chao.,Zhu, Huaze.,Yao, Tingting.,Qiu, Jianhang.,...&Liu, Gang.(2024).A Ta 3 N 5 photoanode with few deep- level defects derived from topologic transition of ammonium tantalum oxyfluoride for ultralow- bias photoelectrochemical water splitting.CHINESE JOURNAL OF CATALYSIS,61,144-153. |
| MLA | Xu, Wei,et al."A Ta 3 N 5 photoanode with few deep- level defects derived from topologic transition of ammonium tantalum oxyfluoride for ultralow- bias photoelectrochemical water splitting".CHINESE JOURNAL OF CATALYSIS 61(2024):144-153. |
入库方式: OAI收割
来源:金属研究所
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