中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Atomic-level rhodium doping into NiO for boosting the selective electrooxidation of HMF to FFCA in neutral electrolyte

文献类型:期刊论文

作者Lu, Xingyu1,2; Wang, Di1,2; Dai, Xueya1,2; Li, Yunlong1,2; Qin, Xiaolan1,2; Qi, Wei1,2
刊名CHEMICAL ENGINEERING JOURNAL
出版日期2024-09-15
卷号496页码:9
关键词Electrooxidation 5-hydroxymethylfurfural Formyl-2-furan carboxylic acid Single atom Electronic structural engineering
ISSN号1385-8947
DOI10.1016/j.cej.2024.154092
通讯作者Qi, Wei(wqi@imr.ac.cn)
英文摘要The oxidation reaction of the biomass derivative 5-hydroxymethylfurfural (HMF) holds immense promise for the sustainable synthesis of high-value chemicals. Nevertheless, achieving the selective electrooxidation of HMF to generate high value-added formyl-2-furan carboxylic acid (FFCA) intermediate remains a serious challenge. Here, the V-NiO-Rh catalyst was constructed and demonstrates an impressive FFCA selectivity of 71 % for HMF electrooxidation reaction (HMFOR) in neutral electrolyte. The designed experiments elucidate that the HMFOR mechanism is the co-adsorption of OH* and HMF* on Ni active sites. Furthermore, the theoretical calculations prove that the modulation of Ni electronic structure by single atom Rh promotes the ability of HMF adsorption and the water electrolysis to release OH*. This paper establishes a theoretical foundation for the selective synthesis of high value-added intermediates products that are challenging to obtain in alkaline media.
资助项目National Natural Science Foundation of China[22072163] ; National Natural Science Foundation of China[U23A20545] ; Shccig-Qinling Program ; China Baowu Low Carbon Metallurgy Innovation Foundation[BWLCF202113] ; IMR Innovation Fund[2023-PY13]
WOS研究方向Engineering
语种英语
WOS记录号WOS:001283663700001
出版者ELSEVIER SCIENCE SA
资助机构National Natural Science Foundation of China ; Shccig-Qinling Program ; China Baowu Low Carbon Metallurgy Innovation Foundation ; IMR Innovation Fund
源URL  
专题金属研究所_中国科学院金属研究所
通讯作者Qi, Wei
作者单位1.Chinese Acad Sci, Inst Met Res, Shenyang Natl Lab Mat Sci, Shenyang 110016, Liaoning, Peoples R China
2.Univ Sci & Technol China, Sch Mat Sci & Engn, Shenyang 110016, Liaoning, Peoples R China
推荐引用方式
GB/T 7714
Lu, Xingyu,Wang, Di,Dai, Xueya,et al. Atomic-level rhodium doping into NiO for boosting the selective electrooxidation of HMF to FFCA in neutral electrolyte[J]. CHEMICAL ENGINEERING JOURNAL,2024,496:9.
APA Lu, Xingyu,Wang, Di,Dai, Xueya,Li, Yunlong,Qin, Xiaolan,&Qi, Wei.(2024).Atomic-level rhodium doping into NiO for boosting the selective electrooxidation of HMF to FFCA in neutral electrolyte.CHEMICAL ENGINEERING JOURNAL,496,9.
MLA Lu, Xingyu,et al."Atomic-level rhodium doping into NiO for boosting the selective electrooxidation of HMF to FFCA in neutral electrolyte".CHEMICAL ENGINEERING JOURNAL 496(2024):9.

入库方式: OAI收割

来源:金属研究所

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